(Invited) Synthesis, Characterization, and Application of Tunable Resistance Coatings Prepared by Atomic Layer Deposition

Elam, Jeffrey W.; Mane, Anil U.; Libera, Joseph A.; Hryn, John N.; Siegmund, Oswald Hw; McPhate, Jason B.; Wetstein, M.; Elagin, A.; Minot, Michael J.; O׳Mahony, Aileen; Wagner, R. G.; Tong, William M.; Brodie, Alan; McCord, Mark A.; Bevis, Christopher F.

doi:10.1149/05810.0249ecst

Cited by 25 publications

(23 citation statements)

References 18 publications

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“…For instance, the nanocomposite films in Figs. B and C were synthesized by switching between the ALD precursors for aluminum oxide (A=trimethyl aluminum, B=H2O), and those for tungsten (C=tungsten hexafluoride, D=disilane) 14,[21][22][23] . The metallic nanoparticles form spontaneously through sintering during film growth.…”

Section: (Eq A)mentioning

confidence: 99%

“… Task Results: The ALD W:Al2O3 nanocomposite films were prepared with W cycle percentages ranging from 0-100% W using previously described methods 14,22 . Briefly, the W ALD was performed using alternating exposures to WF6 and Si2H6 and the Al2O3 ALD used alternating exposures to trimethyl aluminum (TMA) and H2O at a temperature of 200°C.…”

Section: Summary Of Tasksmentioning

confidence: 99%

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Refractory Solar Selective Coatings

Elam¹

2018

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Section: (Eq A)mentioning

confidence: 99%

Section: Summary Of Tasksmentioning

confidence: 99%

Refractory Solar Selective Coatings

Elam¹

2018

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“…The ALD process for each layer is described in Elam et al . [] and Mane and Elam []. Layers of a metal oxide and a metal were applied to the substrate, which could be a glass capillary array.…”

Section: Manufacturing Techniquesmentioning

confidence: 99%

“…ALD is uniquely suited for applying resistive and emissive layers for the fabrication of MCPs, since other conventional thin film coating techniques, such as vacuum evaporation or sputtering are "line of sight" and cannot effectively coat the inside surfaces of high length to diameter ratio (l/d) capillary. The ALD process for each layer is described in Elam et al [2013] and Mane and Elam [2013]. Layers of a metal oxide and a metal were applied to the substrate, which could be a glass capillary array.…”

Section: 1002/2016ja022580mentioning

confidence: 99%

Microchannel plate fabrication using glass capillary arrays with Atomic Layer Deposition films for resistance and gain

et al. 2016

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Microchannel plates (MCPs) have been used for many years in space flight instrumentation as fast, lightweight electron multipliers. A new MCP fabrication method combines a glass substrate composed of hollow glass capillary arrays with thin film coatings to provide the resistive and secondary electron emissive properties. Using this technique, the gain, resistance, and glass properties may be chosen independently. Large‐area MCPs are available at moderate cost. Secondary emission films of Al2O3 and MgO provide sustained high gain as charge is extracted from the MCP. Long lifetimes are possible, and a total extracted charge of 7 C/cm2 has been demonstrated. Background rates are low because the glass substrate has little radioactive potassium 40. Curved MCPs are easily fabricated with this technique to suit instrument symmetries, simplifying secondary electron steering and smoothing azimuthal efficiency.

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“…A key advantage of ALD is its ability to coat small pores with high L/d ratios. Nanocomposite ALD resistive coatings have been developed that meet all of the requirements for large area MCPs [5,6].…”

Section: Ald Coated Mcpsmentioning

confidence: 99%

Pilot production & commercialization of LAPPD™

Minot

Bennis

Bond

et al. 2015

Nuclear Instruments and Methods in Physics Research Section A:

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Keywords:Large-area picosecond photodetectors (LAPPD) Time of flight detector Glass capillary array (GCA) Microchannel plate (MCP) Atomic layer deposition (ALD) a b s t r a c tWe present a progress update on plans to establish pilot production and commercialization of Large Area (400 cm 2 ) Picosecond Photodetector (LAPPD ™ ). Steps being taken to commercialize this MCP and LAPPD ™ technology and begin tile pilot production are presented including (1) the manufacture of 203 mm Â 203 mm borosilicate glass capillary arrays (GCAs), (2) optimization of MCP performance and creation of an ALD coating facility to manufacture MCPs and (3) design, construction and commissioning of UHV tile integration and sealing facility to produce LAPPDs. Taken together these plans provide a "pathway toward commercialization".& 2014 Elsevier B.V. All rights reserved. LAPPDThe Large Area Picosecond Photodetector (LAPPD ™ ) is a microchannel plate (MCP) based photodetector, capable of imaging, and having both high spatial and temporal resolution in a vacuum package with an active area of 400 cm 2 . LAPPD ™ are characterized by a uniquely simple design based upon an all-glass vacuum package comprised of top and bottom plates and square sidewall, each made of borosilicate float glass, depicted in Fig. 1.Key design features of the LAPPD include: (a) an internal chevron pair stack of "next generation" MCPs produced by applying resistive and emissive coatings to borosilicate glass capillary array (GCA) substrates; (b) a modular all-glass detector package with conductive RF microstrips passing through a glass frit seal that hermetically bonds the side walls to the bottom anode plate while allowing electrical contact to the interior of the device; eliminating the need for metal electrical pins penetrating the evacuated detector package; (c) resistively coated spacers that function as high voltage (HV) dividers to distribute voltage across the MCP chevron stack, eliminating the need for separate electrical leads contacting the tops and bottoms of both MCPs; and (d) RF stripline anodes applied to the bottom plate with an analog bandwidth above 1.5 GHz for good spatial and temporal resolution [1]. MCP based photodetectorsMCP's consists of millions of conductive glass capillaries (4-25 mm in diameter) fused together and sliced into a thin plate [2]. Each capillary or channel works as an independent secondary-electron multiplier. Single electrons that hit a pore on one side of the plate convert into large bunches of electrons that cascade from the other side [3], with typical amplification from a pair of plates of 10 7 . Fig. 2 (left) shows a large area glass capillary array (GCA) consisting of millions of 20 mm diameter pores with an overall size of 203 mm Â 203 mm Â 1.2 mm with an aspect ratio¼60:1, bias angle of 81, and open area ratio of 60%. Atomic Layer Deposition (ALD) techniques are used to apply resistive and emissive coatings, converting the GCA into a high performance MCP. A high voltage is applied across the top and bottom surfaces of the...

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(Invited) Synthesis, Characterization, and Application of Tunable Resistance Coatings Prepared by Atomic Layer Deposition

Cited by 25 publications

References 18 publications

Refractory Solar Selective Coatings

Refractory Solar Selective Coatings

Microchannel plate fabrication using glass capillary arrays with Atomic Layer Deposition films for resistance and gain

Pilot production & commercialization of LAPPD™

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