N2O plasma treatment for minimization of background plating in silicon solar cells with Ni–Cu front side metallization

Raval, Mehul C.; Saseendran, Sandeep S.; Suckow, Stephan; Saravanan, S.; Solanki, Chetan Singh; Kottantharayil, Anil

doi:10.1016/j.solmat.2015.10.002

Cited by 8 publications

(2 citation statements)

References 16 publications

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“…Pinholes coupled with Light-Induced-Plating (LIP) lead to ghost plating-the deposition/growth of metal in non-contact locations. Ghost plating reduces finger conductivity, causes pattern loss, and shades the cell, all of which are undesirable in our application [15][16][17].…”

Section: Indirect Removal Of Sin Xmentioning

confidence: 99%

Damage-free laser patterning of silicon nitride on textured crystalline silicon using an amorphous silicon etch mask for Ni/Cu plated silicon solar cells

et al. 2016

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We investigate the optimization of laser ablation with a femtosecond laser for direct and indirect removal of SiN x on alkaline textured c-Si. Our proposed resist-free indirect removal process uses an a-Si:H etch mask and is demonstrated to have a drastically improved surface quality of the laser processed areas when compared to our direct removal process. Scanning electron microscope images of ablated sites show the existence of substantial surface defects for the standard direct removal process, and the reduction of those defects with our proposed process. Opening of SiN x and SiO x passivating layers with laser ablation is a promising alternative to the standard screen print and fire process for making contact to Si solar cells. The potential for small contacts from laser openings of dielectrics coupled with the selective deposition of metal from light induced plating allows for high-aspect-ratio metal contacts for front grid metallization. The minimization of defects generated in this process would serve to enhance the performance of the device and provides the motivation for our work.Published by Elsevier B.V.

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Section: Indirect Removal Of Sin Xmentioning

confidence: 99%

Damage-free laser patterning of silicon nitride on textured crystalline silicon using an amorphous silicon etch mask for Ni/Cu plated silicon solar cells

et al. 2016

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“…[1][2][3][4][5][6][7][8][9] In addition, low silver consumption relatively to solar cell efficiency increase makes light-induced electroplating potential in photovoltaic industry. [10][11][12][13][14][15][16][17][18][19][20][21] In this paper, the focus is on the two-layer electrode of light-induced electroplating after screen-printing. [22][23][24][25] The total power losses, consisted by optical losses and electrical losses, are analyzed for different seed layer electrodes widths by screen-printing in the calculation.…”

Section: Introductionmentioning

confidence: 99%

Improvement on electrical properties of screen-printed silicon solar cells by light-induced electroplating of silver

Tao¹,

Wang²

2016

Jpn. J. Appl. Phys.

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The total power losses are analyzed based on two-layer electrode of light-induced electroplating after screen printing. By the introduction of scale factor in the calculation, optical losses are closer to the actual condition. Optimized two-layer contact of front side could diminish power losses distinctly and improve the current–voltage (I–V) characteristic of crystalline silicon solar cells. The relative increments of I–V parameters as a function of electroplating time are measured. The quantitative comparison of analytical results between half-ellipse shape model and half-circled shape model is performed. The numerical simulation results and experimental data show good agreement. Due to the successful verification, the simulation results could be used to optimize the two-layer electrode structure and light-induced electroplating process.

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Thin uniform nickel seed layer formation and its impact on Ni-Cu contact adhesion for c-Si solar cell applications

2017

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N2O plasma treatment for minimization of background plating in silicon solar cells with Ni–Cu front side metallization

Cited by 8 publications

References 16 publications

Damage-free laser patterning of silicon nitride on textured crystalline silicon using an amorphous silicon etch mask for Ni/Cu plated silicon solar cells

Damage-free laser patterning of silicon nitride on textured crystalline silicon using an amorphous silicon etch mask for Ni/Cu plated silicon solar cells

Improvement on electrical properties of screen-printed silicon solar cells by light-induced electroplating of silver

Thin uniform nickel seed layer formation and its impact on Ni-Cu contact adhesion for c-Si solar cell applications

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