2005
DOI: 10.1063/1.1995956
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Mobility evaluation in transistors with charge-trapping gate dielectrics

Abstract: Physical model for frequency-dependent dynamic charge trapping in metal-oxide-semiconductor field effect transistors with Hf O 2 gate dielectric Appl. Phys. Lett. 86, 093510 (2005); 10.1063/1.1874312Trap evaluations of metal/oxide/silicon field-effect transistors with high-k gate dielectric using charge pumping method Appl.Evaluation of grain boundary trap states in polycrystalline-silicon thin-film transistors by mobility and capacitance measurements

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Cited by 44 publications
(36 citation statements)
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“…Using pulsed I d -time [30,33,73,83] or a correction technique for pulsed I d -V g can circumvent the issues discussed in section IV [81]. In the case of I d -time, very fast rise and fall times can be used since propagation delay is not an issue.…”
Section: Quantifying Trapped Charge and Its Effects On Device Performmentioning
confidence: 99%
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“…Using pulsed I d -time [30,33,73,83] or a correction technique for pulsed I d -V g can circumvent the issues discussed in section IV [81]. In the case of I d -time, very fast rise and fall times can be used since propagation delay is not an issue.…”
Section: Quantifying Trapped Charge and Its Effects On Device Performmentioning
confidence: 99%
“…5) as well, confirming the hysteresis is not real. Therefore, estimating ΔV t as a shift between I d -V g traces corresponding to the rise and fall of the pulse bias may not be accurate [70,83,84] when a non-optimized measurement set-up is used.…”
Section: Measurement Requirementsmentioning
confidence: 99%
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“…In high-k dielectric development, fast pulse I-V could be used to minimize the influence of the charge trapping in a high-k dielectric because the charge trapping took on the order of μsec. If the test can be completed before the charge can accumulate within a high-k dielectric, an intrinsic I-V curve can be obtained [28,29]. There is no clear understanding on how an intrinsic I-V curve can be obtained from hysteretic I-V curves of graphene.…”
Section: Device Structuresmentioning
confidence: 99%