Microliter sample introduction into an inductively-coupled plasma by electrothermal carbon cup vaporization

Ng, Kin C.; Caruso, Joseph A.

doi:10.1016/s0003-2670(01)95501-1

Cited by 56 publications

(23 citation statements)

References 28 publications

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“…are 10 to 100 times better than those reported by others using electrothermal vaporization sample introduction techniques for ICP-AES (12)(13)(14)(15). The drastic improvement appears to be due to the very rapid evolution of the sample from the wire surface with a resulting momentary high concentration of the analyte in the viewing zone.…”

mentioning

confidence: 66%

Application of a wire loop direct sample insertion device for inductively coupled plasma mass spectrometry

Boomer¹,

Powell²,

Sing³

et al. 1986

Anal. Chem.

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Sir: A great deal of interest has been expressed recently with the inductively coupled plasma (ICP) as an ionization source for mass spectrometry (MS) (1-10). In most cases conventional sample introduction systems have been used, though applications of electrothermal sample introduction have been reported (1, 10). In our laboratory at McGill University, we have developed a unique sample introduction system for ICP atomic emission spectrometry (AES) called the wire loop direct sample insertion device (DSID) (11). The sample is applied to a tungsten (or other material) double loop, dried just below the plasma, and then quickly inserted into the core of the plasma along its central axis. With optical detection this system provides detection limits of 0.2 and 0.8 ng/mL for Cu and Zn corresponding to 2 X 10"12 and 0.8 X 10"12 g for the 10-µ sample size used. These detection limits

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mentioning

confidence: 66%

Application of a wire loop direct sample insertion device for inductively coupled plasma mass spectrometry

Boomer¹,

Powell²,

Sing³

et al. 1986

Anal. Chem.

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“…3A'), which indicated incomplete vaporization of Ta and a serious memory effect. The reason for this is that Ta is a refractory and carbide forming element, and the boiling points for Ta and TaC are 5400 uC and 5500 uC, respectively, so tantalum has also been used for the treatment of graphite cups 26 in order to promote electrothermal vaporization. However, dramatic changes of signal profiles of Ta occurred in the presence of PTFE modifier.…”

Section: Fluorination Assisted Electrothermal Vaporizationmentioning

confidence: 99%

Direct determination of trace impurities in niobium pentaoxide solid powder with slurry sampling fluorination assisted electrothermal vaporization inductively coupled plasma mass spectrometry

Jiang

2004

J. Anal. At. Spectrom.

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A method of fluorination assisted electrothermal vaporization inductively coupled plasma mass spectrometry (FETV-ICP-MS) was developed to directly determine the trace impurities in niobium pentaoxide solid powder in which a poly(tetrafluoroethylene) (PTFE) emulsion was used as fluorinating modifier to promote the vaporization of refractory elements from a graphite furnace and to avoid the formation of thermally stable carbides. The solid sample was introduced into the graphite furnace in the form of slurry without any chemical pretreatments. The electrothermal vaporizer device was connected to the ICP system by a laboratory-built interface, and the flow rates of sample carrier gas and auxiliary carrier gas were optimized experimentally. The potentially polyatomic interferences resulting from the pyrolysates of PTFE were evaluated. A new method by stepwise diluting the sample matrix is proposed for investigating the matrix effect and the results showed that no obvious matrix effect was observed with a sample matrix (Nb 2 O 5 ) concentration of less than 200 mg L 21 . Under the optimal conditions, the absolute limits of detection for FETV-ICP-MS determination of Ta, Ti, Cr, W, Ni, Cu and Mn were in the range of 0.026-1.1 pg. For one analysis run, only 0.002 mg of Nb 2 O 5 sample was required. The proposed method has been applied to determining the trace impurities in Nb 2 O 5 powder, and both the results obtained from the external calibration method and the standard addition method were in a good agreement with those obtained by conventional nebulization ICP-MS.

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“…The electrothermal vaporizer (ETV) is a most useful device when coupled to ICP-AES systems (13)(14)(15)(16)(17)(18)(19)(20). Very small sample volumes are used and extremely low absolute detection limits have been achieved.…”

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confidence: 99%

Time gating for the elimination of interferences in electrothermal vaporization-inductively coupled plasma atomic emission spectrometry

Tikkanen¹,

Niemczyk²

1986

Anal. Chem.

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Microliter sample introduction into an inductively-coupled plasma by electrothermal carbon cup vaporization

Cited by 56 publications

References 28 publications

Application of a wire loop direct sample insertion device for inductively coupled plasma mass spectrometry

Application of a wire loop direct sample insertion device for inductively coupled plasma mass spectrometry

Direct determination of trace impurities in niobium pentaoxide solid powder with slurry sampling fluorination assisted electrothermal vaporization inductively coupled plasma mass spectrometry

Time gating for the elimination of interferences in electrothermal vaporization-inductively coupled plasma atomic emission spectrometry

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