Application of a wire loop direct sample insertion device for inductively coupled plasma mass spectrometry

Abstract

Sir: A great deal of interest has been expressed recently with the inductively coupled plasma (ICP) as an ionization source for mass spectrometry (MS) (1-10). In most cases conventional sample introduction systems have been used, though applications of electrothermal sample introduction have been reported (1, 10). In our laboratory at McGill University, we have developed a unique sample introduction system for ICP atomic emission spectrometry (AES) called the wire loop direct sample insertion device (DSID) (11). The sample is applied to a tungsten (or other material) double loop, dried just below the plasma, and then quickly inserted into the core of the plasma along its central axis. With optical detection this system provides detection limits of 0.2 and 0.8 ng/mL for Cu and Zn corresponding to 2 X 10"12 and 0.8 X 10"12 g for the 10-µ sample size used. These detection limits

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