1988
DOI: 10.1109/16.8790
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Mechanical stress as a function of temperature in aluminum films

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Cited by 155 publications
(54 citation statements)
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“…Above 85°C, the film deviates from linear behavior, suggesting that some microstructural changes are taking place [21]. Further temperature excursion is observed to result in a rapid decrease in the measured stress from -200 MPa at 100°C to about -75 MPa at 325°C.…”
Section: Measurement Of Cu-film Thicknessmentioning
confidence: 88%
“…Above 85°C, the film deviates from linear behavior, suggesting that some microstructural changes are taking place [21]. Further temperature excursion is observed to result in a rapid decrease in the measured stress from -200 MPa at 100°C to about -75 MPa at 325°C.…”
Section: Measurement Of Cu-film Thicknessmentioning
confidence: 88%
“…Wafer curvature measurements can provide important information about the film's elastic and plastic properties when either the coefficient of thermal expansion or the biaxial modulus is known. 2 Determination of these parameters for nanoinks has to be done empirically rather than inferred from literature.…”
Section: Introductionmentioning
confidence: 99%
“…Amorphous DLC films (sp 3 bonded) up to a few micrometers thick can be prepared by pulsed-laser deposition [20], magnetron sputtering with ion plating [21], or a filtered-cathode vacuum arc [22]. A few micrometer-thick aluminum films can be achieved by sputtering [23], [24], which is an established and proven microfabrication route. These material combinations could at best yield ∼1.2 kHz for L = 100 µm and are limited by the cooling rates achieved by conduction and natural convection at small scales.…”
Section: Resultsmentioning
confidence: 99%