Mechanical properties of carbon-modified silicon oxide barrier films deposited by plasma enhanced chemical vapor deposition on polymer substrates

Bieder, Andrea; Gondoin, V.; Leterrier, Y.; Tornare, G.; Rohr, Ph. Rudolf von; Månson, J.-Å. E.

doi:10.1016/j.tsf.2006.12.176

Cited by 14 publications

(9 citation statements)

References 20 publications

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“…Fragmentation tests [28][29][30][31] were undertaken to verify the advantages of creating a graded architecture by examining the mechanical integrity of the layers, using a PES substrate. The elastic properties of the polymer (Young's modulus 2.5 GPa, Poisson's ratio 0.4) and of the Al 2 O 3 and SiO 2 layers were taken from the literature, and values for the composite layers were calculated using the rule of mixture.…”

Section: Mechanical Analysis Of Non-graded and Graded Filmsmentioning

confidence: 99%

Design and fabrication of compositionally graded inorganic oxide thin films: Mechanical, optical and permeation characteristics

et al. 2010

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Section: Mechanical Analysis Of Non-graded and Graded Filmsmentioning

confidence: 99%

Design and fabrication of compositionally graded inorganic oxide thin films: Mechanical, optical and permeation characteristics

et al. 2010

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“…The thickness of a SiO x barrier coating on polymeric materials typically ranges from 10 to 100 nm. 5,[31][32][33][34][35] The Airco Coating Technology has been one of the early investigators on improving barrier properties of polyethylene foil and reported 28 times barrier improvement in early 90s. 23 Recently, researchers reported a 40% decrease or 18.6 times reduction in the oxygen transmission rate (OTR) of LDPE foil by PECVD of SiO x coating.…”

Section: Introductionmentioning

confidence: 99%

Oxygen barrier coating deposited by novel plasma‐enhanced chemical vapor deposition

Jiang

Benter²,

Taboryski

et al. 2009

J of Applied Polymer Sci

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ABSTRACT:We report the use of a novel plasmaenhanced chemical vapor deposition chamber with coaxial electrode geometry for the SiO x deposition. This novel plasma setup exploits the diffusion of electrons through the inner most electrode to the interior samples space as the major energy source. This configuration enables a gentle treatment of sensitive materials like low-density polyethylene foils and biodegradable materials. SiO x coatings deposited in the novel setup were compared with other state of the art plasma coatings and were found to possess equally good or better barrier properties. The barrier effect of single-layer coatings deposited under different reaction conditions was studied. The coating thickness and the carbon content in the coatings were found to be the critical parameters for the barrier property. The novel barrier coating was applied on different polymeric materials, and it increased the barrier property of the modified low-density polyethylene, polyethylene terephthalate, and polylactide by 96.48%, 99.69%, and 99.25%, respectively.

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“…Plasma‐Enhanced Chemical Vapor Deposition (PECVD) using organosilicon compounds as precursors is a milestone in the technology of gas/vapor barrier coatings for food and pharmaceutical packaging. SiO 2 ‐like (from now on denoted SiO x ) coatings offer several advantages, in fact they are dense, transparent, colorless, microwaveable and do not affect recycling 1–6. An important feature of SiO x films produced by PECVD is that generally a broad interface region coating/polymer on plastic substrates is achieved, more than a net one, with beneficial consequences regarding the material performance 5…”

Section: Introductionmentioning

confidence: 99%

“…SiO x processes for reaching low gas transmission rates are mostly based on siloxane organosilicon precursors, such as hexamethyldisiloxane (HMDSO) 1–7. Also, plasma produced silicon nitride films are adopted 8.…”

Section: Introductionmentioning

confidence: 99%

“…Recently, the scientific community involved in the development of hi‐tech products, such as liquid‐crystal and electroluminescent displays, radio‐frequency identification tags, solar cells, etc., has devoted a deal of attention to various multilayer approaches6, 11, 12 to satisfy the new barrier demands, i.e. water vapor transmission rates (WTR) lower than 10 −3 g · m −2 · d −1 .…”

Section: Introductionmentioning

confidence: 99%

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Deposition of Barrier Coatings from Vinyltrimethylsilane‐Fed Glow Discharges

Francescangeli

Palumbo

d’Agostino

2008

Plasma Processes & Polymers

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Radio‐frequency glow discharges fed with vinyltrimethylsilane have been studied for the deposition of barrier coatings onto polymer substrates as single or multiple layers. The deposition process has been investigated considering both the chemistry of the coatings and the spectroscopic analysis of the gas phase. It has been shown that RF power and oxygen addition allow one to switch from organosilane films to silica‐like inorganic, dense, barrier films. A deposition mechanism is suggested for the interpretation of the deposition kinetics. Furthermore, it has been shown that vinyltrimethylsilane can be conveniently exploited as single monomer for the deposition of organic/inorganic multistacks with high barrier performances.

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Mechanical properties of carbon-modified silicon oxide barrier films deposited by plasma enhanced chemical vapor deposition on polymer substrates

Cited by 14 publications

References 20 publications

Design and fabrication of compositionally graded inorganic oxide thin films: Mechanical, optical and permeation characteristics

Design and fabrication of compositionally graded inorganic oxide thin films: Mechanical, optical and permeation characteristics

Oxygen barrier coating deposited by novel plasma‐enhanced chemical vapor deposition

Deposition of Barrier Coatings from Vinyltrimethylsilane‐Fed Glow Discharges

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