Deposition of Barrier Coatings from Vinyltrimethylsilane‐Fed Glow Discharges

Abstract

Radio‐frequency glow discharges fed with vinyltrimethylsilane have been studied for the deposition of barrier coatings onto polymer substrates as single or multiple layers. The deposition process has been investigated considering both the chemistry of the coatings and the spectroscopic analysis of the gas phase. It has been shown that RF power and oxygen addition allow one to switch from organosilane films to silica‐like inorganic, dense, barrier films. A deposition mechanism is suggested for the interpretation of the deposition kinetics. Furthermore, it has been shown that vinyltrimethylsilane can be conveniently exploited as single monomer for the deposition of organic/inorganic multistacks with high barrier performances.

Smooth and Self‐Similar SiO2‐like Films on Polymers Synthesized in Roll‐to‐Roll Atmospheric Pressure‐PECVD for Gas Diffusion Barrier Applications

“…The best values reported here are obtained without any precleaning measures taken to minimize the particle or defects on the polymer substrate. These very low barrier values for single layer SiO 2 ‐like films, to the authors knowledge, have never been achieved from either well established low pressure4, 7, 33, 34 or emerging high pressure plasma technologies 35, 36. The intrinsic high‐quality of the layers; i.e., adhesion, smoothness, uniformity, purity, packing density and low level of surface defects comparable to the uncoated polymer surface may all contribute to the enhanced barrier properties.…”

The impact of the nano-pore filling on the performance of organosilicon-based moisture barriers

“…For each system a single SiO 2 layer was deposited as a reference. The 100-nm-thick SiO 2 layer shows already very good effective barrier properties, with an average barrier improvement factor (BIF) of 80 with respect to the pristine PEN substrate, superior to other values reported in literature for PE-CVD deposited SiO 2 layers [16,19,50]. When two 100-nm-thick SiO 2 layers are coupled with a 200-nmthick poly(V 3 D 3 ) layer, the barrier property of the multilayer further improves, with an overall BIF with respect to the pristine PEN of 1000.…”

“…Additionally, different deposition approaches such as atomic layer deposition (ALD) in combination with molecular layer deposition [10][11][12][13][14], and all PE-CVD developed multilayers have been reported in literature [15][16][17][18]. Coclite et al [19] reported on the deposition of multilayers based on organosilicon chemistry, in which the inorganic barrier layer is deposited by means of PE-CVD and the organic interlayer is deposited by means of initiated-CVD (i-CVD) [20][21][22].…”

Plasma Deposited Organosilicon Multistacks for High‐Performance Low‐Carbon Steel Protection

“…Low monomer depletions can be ascribed to the high pressure and low power, which result in low‐energy electron collisions and in turn low fragmentation and in formation of heavy “structure‐retaining” fragments. Also the lack of the oxygen in the gas feed, which would enhance the monomer fragmentation in low power discharges, contributes to reduce the reaction pathways in the organic glow discharges 30. In the modulated plasmas, the maximum monomer fragmentation is achieved at DC = 35% and then remains constant for DC > 35% as shown in Figure 8b.…”