2010
DOI: 10.1016/j.actamat.2010.08.011
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Design and fabrication of compositionally graded inorganic oxide thin films: Mechanical, optical and permeation characteristics

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Cited by 22 publications
(7 citation statements)
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“…15-40 nm, lies in the saturation region. This means that the water permeation rate remained almost the same and is not greatly enhanced with the increase in film thickness, because of the increase in number of defects [28]. Al 2 O 3 thin gas barrier films with such low water permeation rate values of $ 10 À 3 g m À 2 day À 1 fabricated through R2R-AALD on PET substrates at low temperature of 50 1C have never been reported before.…”
Section: Resultsmentioning
confidence: 91%
“…15-40 nm, lies in the saturation region. This means that the water permeation rate remained almost the same and is not greatly enhanced with the increase in film thickness, because of the increase in number of defects [28]. Al 2 O 3 thin gas barrier films with such low water permeation rate values of $ 10 À 3 g m À 2 day À 1 fabricated through R2R-AALD on PET substrates at low temperature of 50 1C have never been reported before.…”
Section: Resultsmentioning
confidence: 91%
“…Changes in the deconvolution of Si 2p spectra were observed after metal doping of the denim-based adsorbents. These modified samples showed the presence of a symmetric single peak that can be associated with the incorporation of metallic ions (i.e., Al 3+ , La 3+ and Fe 3+ ) on the adsorbent surface forming new Si-O-X interactions, where X = Al, La and Fe[26,38,[43][44][45][46]. The presence of Si-O-Al bonds was confirmed by the binding energies of the Al 2p…”
mentioning
confidence: 86%
“…Although the inorganic films comprised of Al 2 O 3 , SiO 2 , SiN x , graphene oxide, and clay have been commonly applied for the thin-film encapsulation, an inorganic single layer has suffered from a low gas-barrier performance with a high water vapor transmission rate (WVTR) value between 0.1 and 100 g m À 2 day À 1 [4][5][6]. Meanwhile, the films coated more densely by atomic layer deposition are limited in the mass production in spite of their excellent gas-barrier performance with 10 À 5 -10 À 6 g m À 2 day À 1 in WVTR [7].…”
Section: Introductionmentioning
confidence: 99%