2009
DOI: 10.1002/app.30222
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Oxygen barrier coating deposited by novel plasma‐enhanced chemical vapor deposition

Abstract: ABSTRACT:We report the use of a novel plasmaenhanced chemical vapor deposition chamber with coaxial electrode geometry for the SiO x deposition. This novel plasma setup exploits the diffusion of electrons through the inner most electrode to the interior samples space as the major energy source. This configuration enables a gentle treatment of sensitive materials like low-density polyethylene foils and biodegradable materials. SiO x coatings deposited in the novel setup were compared with other state of the art… Show more

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Cited by 14 publications
(8 citation statements)
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“…These can be obtained through mainly two ways. Improving the oxygen barrier of PLA by adding a barrier layer (Iotti et al, 2009;Jiang et al, 2010) or using additives to increase the tortuosity of the oxygen pathway when diffusing through PLA packaging (Thellen et al, 2005;Arora and Padua, 2010). An indirect way to compensate the effect of the oxygen entering the package made of PLA is by adding antioxidants to control the product oxidative reactions.…”
Section: Introductionmentioning
confidence: 99%
“…These can be obtained through mainly two ways. Improving the oxygen barrier of PLA by adding a barrier layer (Iotti et al, 2009;Jiang et al, 2010) or using additives to increase the tortuosity of the oxygen pathway when diffusing through PLA packaging (Thellen et al, 2005;Arora and Padua, 2010). An indirect way to compensate the effect of the oxygen entering the package made of PLA is by adding antioxidants to control the product oxidative reactions.…”
Section: Introductionmentioning
confidence: 99%
“…For many years, barrier coatings have been developed on polymeric substrates to limit the diffusion of numerous gaseous species . They are often made of inorganic compounds such as SiO x or Al x O y inorganic prepared by plasma‐based methods . In this work, we develop plasma polymer barriers which are organic‐based coatings synthesized from the dissociation of vaporized organic precursors in cold plasma.…”
Section: Introductionmentioning
confidence: 99%
“…Surprisingly the combination of PLA substrates with a plasma‐deposited barrier coating is poorly reported. Nevertheless, it is worth pointing out the works of Jiang et al and Uemura et al which consisted to deposit SiO x coating, i.e., common barrier coatings in food industry, on PLA surface by means of low temperature tetramethoxysilane‐based plasma treatment and hexamethyldisiloxane‐based plasma enhanced chemical vapour deposition (PECVD), respectively . SiO 2 layers are not (bio)degradable and their permeation efficiency proved extremely high therefore completely limiting the diffusion of gases, including water vapour that is, as a consequence, no more available for triggering any PLA degradation.…”
Section: Introductionmentioning
confidence: 99%