2002
DOI: 10.1016/s0928-4931(01)00469-6
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Measurement systems based on metal/dielectric nanostructures for electrochemical analyses

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Cited by 14 publications
(7 citation statements)
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“…The wet etching process is commonly used for this purpose, comprehensive simulation and experimental studies of the profile evolution during anisotropic wet etching being already available [29]. Furthermore, additional technological processes can be utilized to improve the electrode characteristics; thus, the deep reactive ion etching (DRIE) leads to high aspect ratio electrodes [30] and also, a supplementary sharpening of the electrode tip could be achieved by using a short isotropic wet etching process [31]. Different etching routes have been explored, tuning the process parameters, to obtain the finest electrodes; actually, it was not a single process, because our technological experiments showed that better results are obtained when both dry and wet etching are used together.…”
Section: Resultsmentioning
confidence: 99%
“…The wet etching process is commonly used for this purpose, comprehensive simulation and experimental studies of the profile evolution during anisotropic wet etching being already available [29]. Furthermore, additional technological processes can be utilized to improve the electrode characteristics; thus, the deep reactive ion etching (DRIE) leads to high aspect ratio electrodes [30] and also, a supplementary sharpening of the electrode tip could be achieved by using a short isotropic wet etching process [31]. Different etching routes have been explored, tuning the process parameters, to obtain the finest electrodes; actually, it was not a single process, because our technological experiments showed that better results are obtained when both dry and wet etching are used together.…”
Section: Resultsmentioning
confidence: 99%
“…However, the development of techniques such as nanoimprint lithography (NIL) [17], focused ion beam (FIB) milling [18] and laser ablation, complemented by high-resolution etching techniques such as reactive ion etching (RIE) [19], have lead to the production of nanoelectrodes [20]. These nanoelectrode geometries potentially have advantages with respect to their microfabricated analogues because they have improved spatial resolution and reduced signal noise [21].…”
Section: A Development Of the Biosensormentioning
confidence: 99%
“…Silicon nanocrystals(Si -ncs), coated with iron, were introduced by spin coating into the periodical holes of a Si(100) substrate [n -type Si(100) heavily doped (Sb) with an electrical resistivity of 3 m Ω · cm] created by a lithographic process which is described elsewhere [50] . The holes have a diameter of 7 µ m, a thickness of 300 nm and a mean hole distance of 3 µ m).…”
Section: Carbon Nanotubes Growth On Periodically Patterned Structurementioning
confidence: 99%