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1958
DOI: 10.1016/0022-3697(58)90066-0
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Measurement of surface recombination velocity in silicon by steady-state photoconductance

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Cited by 9 publications
(3 citation statements)
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“…In general, the injection ratio depends on the applied bias and the energy of the Schottky barrier. Under forward bias, Υ rises with the forward current. , Using practical values of v s,n and v s,p for Si, our method reproduces an uprising trend for Υ with respect to the total current as illustrated by the blue and red curves in Figure d. Importantly, if one gradually reduces v s,p (while maintaining v s,n at a fixed value), the contact should become more “electron-selective”, resulting in a reduced injection ratio with increasing bias (or current flow).…”
Section: Resultsmentioning
confidence: 71%
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“…In general, the injection ratio depends on the applied bias and the energy of the Schottky barrier. Under forward bias, Υ rises with the forward current. , Using practical values of v s,n and v s,p for Si, our method reproduces an uprising trend for Υ with respect to the total current as illustrated by the blue and red curves in Figure d. Importantly, if one gradually reduces v s,p (while maintaining v s,n at a fixed value), the contact should become more “electron-selective”, resulting in a reduced injection ratio with increasing bias (or current flow).…”
Section: Resultsmentioning
confidence: 71%
“…From Figure a, we can see that the metal–Si junction forms a Schottky contact with a barrier height of ∼0.45 eV. To model the electron and hole transport across this junction, we have assumed initial interfacial transfer velocities of v s,n = 10 5 m s –1 and v s,p = 10 4 m s –1 , typical for Si . Importantly, this equilibration process (unbiased) physically represents zero net electron (majority) transfer via the conduction band, as well as zero net hole (minority) transfer via the valence band, which is formally defined by both eqs and falling to zero.…”
Section: Resultsmentioning
confidence: 99%
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