power distribution structure, and iii) overall module cost and ! ~~~~ ~ Advances in CMOS technology continue to provide performance.can be further reduced for vo limited flin-chin (c4, ,,ad increased circuit density and performance at a lower Cost. Die core via impact On a 214i2 structure having size and 212,300 and 375um core via pitches for various signal counts will be examined. The power distribution figure of merit based bv shrinking the area on different core via pitches, number of build up layers and.. pitch. These advances continue to drive package ground rule improvements to eficiently distribute signal and power reducing Cost, One such groundrule for organic build-up presented. The number Of rows (si@a1 count) wired Out is performance comparison, for a specific application, to optimize both the chip size and the package layer'count for the best module cost and performance IS also considered.
Background: Buildup Technology Descriptionpackages is the core via pitch. Core via pitch reduction can significantly improve the package power distribution and buildup , signal escape. This paper presents the package design tradeoffs for core via pitch reduction to support a 90nm 9.3mm ASIC die using a m u m full area array C4 pitch. The impactThe sequential Buildup chip carrier technology starts with of core via pitch on Power distribution P e r f m u " an FR4 or BT printed wiring board with plated through boles wireability, and cost will be presented, including electrical (PTH) [2,3]. Those PTH's will be called core vias. A liquid or modeling and simulation results. Design trade-offs to optimize dry film dielectric is applied Over the surface, and micro vias both the chip and package are presented, including die C4 pad to the layer directly below are formed by laser or pitch and depth versus module cost and performance photolithography processes, followed by subtractive or 1. lntrnductinn additive plating processes to form the circuitry. These steps ~ ~~~.~ .__.... ~~ can be repeated as many times as needed. The buildup via Process can Provide large numbers of small blind and buried packaging solution that will meet stringent electrical vias economically, consuming far less real estate than normal Electronic core vias. The blind vias of the buildup technology are much Today the semiconductor industry is faced with the difficult challenge of developing a effective eleckonic of high Derformance SvStemS. smaller than core via (PTHs). -. packaging suppliers continue to aggressively invest in the development of advanced groundrules. This is required to stay build UP layers on both side are competitive and meet challenges driven by the same for mechanical reasons and are represented by the advancements in the semiconductor indusm. The 2003 term x-y-x, where X represents the number of buildup layersInternational Technology Roadmap for Semiconductors [ 11 and y the number of core layers. The 2-4-2 sequential buildup predicts a rapid reduction in the flip chip pad pitch, This puts carrier is f "ed by W O build UP layers on...