“…The temperature dependence of electrical characteristics of these devices has been widely investigated in the literature [35][36][37][38][39][40][41][42][43][44][45][46]. In our previous work [20], we have investigated temperature and voltage dependent current transport mechanisms in GaAs/AlGaAs single-quantum-well lasers using forward and reverse bias I-V measurements in the temperature range of 80-360 K. The analysis of the experimental I-V data of the studied structures indicated that the current-transport was controlled by the Thermionic Field-Emission (TFE) mechanism below 170 K and Thermionic Emission (TE) mechanism above 200 K. The high values of n especially at low temperatures showed that the conduction is controlled by TFE [7,20].…”
“…The temperature dependence of electrical characteristics of these devices has been widely investigated in the literature [35][36][37][38][39][40][41][42][43][44][45][46]. In our previous work [20], we have investigated temperature and voltage dependent current transport mechanisms in GaAs/AlGaAs single-quantum-well lasers using forward and reverse bias I-V measurements in the temperature range of 80-360 K. The analysis of the experimental I-V data of the studied structures indicated that the current-transport was controlled by the Thermionic Field-Emission (TFE) mechanism below 170 K and Thermionic Emission (TE) mechanism above 200 K. The high values of n especially at low temperatures showed that the conduction is controlled by TFE [7,20].…”
“…As can be seen in Fig. 5, the conventional Richardson plot has a nonlinear part below 160 K which may be caused by the temperature dependence of the BH and ideality factor, particularly pronounced at low temperatures, due to the existence of the surface inhomogeneities of the Si substrate [1][2][3][4][5][6]14,22]. That is, the observed behavior in the Richardson plot may be due to the spatially inhomogeneous BHs and potential fluctuations at the interface that contains low and high barrier areas [44,45].…”
Section: Resultsmentioning
confidence: 99%
“…Metal film deposition on Si semiconductor has received much attention for the fabrication of optoelectronics, microwave devices, and integrated circuits used in modern highsped optical system. Thus, due to the technological importance of metal-semiconductor Schottky contacts, a full understanding of their current-voltage (I-V) and capacitance-voltage (C-V) characteristics are of great interest [1][2][3][4][5][6][7][8][9]. Schottky contacts with low barrier height find applications in devices operating at cryogenic temperatures such as infrared detectors, sensors in thermal imaging, microwave diodes, gates of transistors and infrared and nuclear particle detectors [10][11][12][13][14].…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, the temperature dependence of the I-V characteristics allows us to understand different aspects of conduction mechanisms across the MS interface and the study of different effects such as barrier inhomogeneities and surface states density on carrier transport at MS Schottky contacts [19][20][21][22][23]. The analysis of the I-V characteristics of SBDs based on the TE theory usually reveals an abnormal decrease in the BH˚b and an increase in the ideality factor n with decreasing temperature [1][2][3][4]15]. The decrease in the barrier height at low temperatures in fact leads to nonlinearity in the activation energy (ln(I 0 /T 2 ) versus 1/T) plot.…”
Section: Introductionmentioning
confidence: 99%
“…Many experimental and theoretical studies of the current flow mechanism in Schottky barriers have been reported in the literature [2,6,[10][11][12][23][24][25][26]. For example, Hasegawa et al [27,28] have characterized both experimentally and theoretically electrical properties of nanometer-sized Schottky contacts which are successfully formed on n-GaAs and n-InP substrates by a combination of an electrochemical process and an electron-beam (EB) lithography.…”
Herein, a comprehensive model is presented for the calculation of entire current–voltage (IV) characteristics of Schottky contacts (SCs). This treatment allows to analyze in detail the physical and technological origins of empirical fit parameters like the ideality factor. This model considers variations of the semiconductor net doping density in growth direction and barrier height inhomogeneities. The only input parameters required are the doping profile, the mean value, and the standard deviation of the barrier height distribution as well as material parameters. As measuring conditions like the integration time impact measured IV characteristics, similar sweep parameters as applied during a measurement are included in the model and proven to be necessary for the understanding of charging currents and the shift of the voltage for zero current. Using this model, various nonidealities reported in literature are explained. Further, the influence of differently doped interfacial layers on the characteristics is studied. Finally, the model is applied to multiple datasets of IV characteristics of SCs on different materials published in literature and from this laboratory, enabling a fundamental understanding of the origins of the nonidealities observed as well as the distinction between the contributions of different transport mechanisms to the total current.
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