Maskless ion beam assisted deposition of W and Ta films

Gamo, Kenji; Takehara, Daisuke; Hamamura, Yasushi; Tomita, M.; Namba, Seitoku

doi:10.1016/0167-9317(86)90043-2

Cited by 61 publications

(14 citation statements)

References 5 publications

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“…1 It also allows us to deposit various materials such as diamondlike carbon ͑DLC͒, 1,2 tungsten, [3][4][5] and SiO x , 6,7 by changing the gas source. FIB-CVD can be used to fabricate arbitrary 3D structures such as wine glasses, bellows, and coils at any local position.…”

Section: Introductionmentioning

confidence: 99%

Resistivity change of the diamondlike carbon, deposited by focused-ion-beam chemical vapor deposition, induced by the annealing treatment

Kometani

Ichihashi

Kanda

et al. 2008

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Articles you may be interested inPiezoresistive effect in the three-dimensional diamondlike carbon nanostructure fabricated by focused-ion-beam chemical vapor deposition J. Vac. Sci. Technol. B 28, C6F38 (2010); 10.1116/1.3504584 Mechanical characteristics and applications of diamondlike-carbon cantilevers fabricated by focused-ion-beam chemical vapor depositionMechanical characteristics and its annealing effect of diamondlike-carbon nanosprings fabricated by focused-ionbeam chemical vapor deposition

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Section: Introductionmentioning

confidence: 99%

Resistivity change of the diamondlike carbon, deposited by focused-ion-beam chemical vapor deposition, induced by the annealing treatment

Kometani

Ichihashi

Kanda

et al. 2008

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

View full text Add to dashboard Cite

show abstract

“…6 By using appropriate precursors, deposition by IBID have been achieved for a variety of materials, including W, C, Pt, SiO x , Au, Al, and Cu. [7][8][9][10][11][12][13] From the above list of materials, it is clear that IBID research is principally driven by the needs of the semiconductor industry, such as fixing integrated circuits (IC) on Silicon chips. However, to our best knowledge, the IBID technique has never been used for the deposition of superconducting materials.…”

mentioning

confidence: 99%

Focused-ion-beam-induced deposition of superconducting nanowires

Sadki¹,

Ooi²,

Hirata³

2004

Applied Physics Letters

142

165

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Superconducting nanowires, with a critical temperature of 5.2 K, have been synthesized using an ion-beam-induced deposition, with a Gallium focused ion beam and Tungsten Carboxyl, W(CO) 6 , as precursor. The films are amorphous, with atomic concentrations of about 40, 40, and 20 % for W, C, and Ga, respectively. Zero Kelvin values of the upper critical field and coherence length of 9.5 T and 5.9 nm, respectively, are deduced from the resistivity data at different applied magnetic fields. The critical current density is J c = 1.5 10 5 A/cm 2 at 3 K. This technique can be used as a template-free fabrication method for superconducting devices.

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“…With laser deposition, thermal diffusion in the substrate results in a deposition area larger than the laser beam diameter, [15] and, at a lower limit ofti 1.0 um, laser technology is already inadequate for the level of photomask technology anticipated in the near future.…”

Section: Sputtered Particlesmentioning

confidence: 99%

Fib Mask Repair With Microtrim

Kaufmann

Thompson

Dunn

1986

Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V

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A FIB (focused ion beam) system for the repair of clear and opaque photomask defects is described.FIB technology is uniquely capable of repairing submicron clear and opaque defects.Opaque defects are repaired by ion beam sputtering. Clear defects are repaired by the deposition of a tenaciously adherent, opaque carbon film from a hydrocarbon gas. A number of mask repair examples are shown, and the results of adhesion and chemical resistance tests of the carbon films are presented.

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Maskless ion beam assisted deposition of W and Ta films

Cited by 61 publications

References 5 publications

Resistivity change of the diamondlike carbon, deposited by focused-ion-beam chemical vapor deposition, induced by the annealing treatment

Resistivity change of the diamondlike carbon, deposited by focused-ion-beam chemical vapor deposition, induced by the annealing treatment

Focused-ion-beam-induced deposition of superconducting nanowires

Fib Mask Repair With Microtrim

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