1999
DOI: 10.1016/s0924-4247(98)00304-5
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Low temperature crystallised Ti-rich NiTi shape memory alloy films for microactuators

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Cited by 56 publications
(17 citation statements)
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“…Despite the high substrate temperature during sputtering, the as-deposited films were amorphous. This is consistent [16] with the fact that the film composition was slightly Ni-rich, as determined using x-ray fluorescence and energy dispersive x-ray spectroscopy.…”
Section: Methodssupporting
confidence: 88%
“…Despite the high substrate temperature during sputtering, the as-deposited films were amorphous. This is consistent [16] with the fact that the film composition was slightly Ni-rich, as determined using x-ray fluorescence and energy dispersive x-ray spectroscopy.…”
Section: Methodssupporting
confidence: 88%
“…This capacity has made NiTi a desirable material for many applications including MEMS, [1] biomedical devices, [2,3] and civil infrastructure. [4±6] One of the first mainstream uses of NiTi was in orthodontics, in which drawn NiTi wires were used as arc wires to apply a constant force to a patient's teeth.…”
mentioning
confidence: 99%
“…In-situ or ex-situ heat treatment is carried out at about 500°C-700°C for 1 to 4 h in a high vacuum, such as 10 −5 Pa, in order to avoid the formation of oxides [13][14][15]. In recent studies, efforts have been exerted to achieve directly in-situ crystalline form shape memory films to avoid the drawbacks of heat treatment [16][17][18][19][20]. For this purpose, substrate temperatures were raised above 450°C-500°C at the deposition process to obtain crystalline structure.…”
Section: Introductionmentioning
confidence: 99%