A low temperature in-situ crystalline TiNi shape memory thin film deposited by magnetron sputtering

Çiçek, Hikmet; Efeoğlu, İhsan; Totık, Yaşar; Ezirmik, Kadri Vefa; Arslan, Ersin

doi:10.1016/j.surfcoat.2015.08.068

Cited by 10 publications

(2 citation statements)

References 28 publications

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“…C-HPMS shows significant heat accumulation because of the high-power discharge [46]. Generally, the temperature is below 800 K in dcMS [47] but can increase to 1000-2000 K to produce a large gradient in the ionization region in C-HPMS [48]. Hence, the plasma heat transfer model [33] is introduced to analyze the temperature distribution in the discharge region, as shown in figure 5.…”

Section: Resultsmentioning

confidence: 99%

High-precision modeling of dynamic etching in high-power magnetron sputtering

Cui¹,

Chen²,

Guo³

et al. 2022

J. Phys. D: Appl. Phys.

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Etching of the cathodes in magnetron sputtering determines the plasma discharge properties and deposition efficiency. In high-power and high-ionization discharges, etching becomes more complicated, resulting in inaccurate results if the conventional models are still used. This work aims at establishing an accurate dynamic model for high-power and high-ionization discharges by combining the cellular automata (CA) method and particle-in-cell/Monte Carlo collision (PIC/MCC) method, in which all the interactions pertaining to the etching morphology, plasma density, electric field, and magnetic field are considered. In high-power discharges such as continuous high-power magnetron sputtering (C-HPMS), strong self-sputtering and intense gas rarefaction stemming from the high temperature in the vicinity of the target influence the etching behavior. Compared to the experimental results, the morphology simulated by the dynamic etching model shows an error of only 0.8% in C-HPMS, which is much less than that obtained by the traditional test-electron Monte Carlo (MC) method (10.1%) and static PIC/MCC method (4.0%). The dynamic etching model provides more accurate results to aid the development and industrial application of high-power magnetron sputtering.

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Section: Resultsmentioning

confidence: 99%

High-precision modeling of dynamic etching in high-power magnetron sputtering

Cui¹,

Chen²,

Guo³

et al. 2022

J. Phys. D: Appl. Phys.

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show abstract

“…In addition, the TiNi coating is expected to impart self-healing properties to materials owing to its shape memory effect and pseudoelasticity [10,11]. Therefore, several studies have been conducted on TiNi coatings using traditional coating methods such as laser-plasma spraying [12,13], vacuum plasma spraying (VPS) [14,15], atmospheric plasma spraying (APS) [16], cold spraying [17][18][19], and magnetron sputtering [20,21]. The previous studies reported that the TiNi alloy coatings were successfully obtained by conventional methods.…”

Section: Introductionmentioning

confidence: 99%

Fusion of Ni Plating on CP-Titanium by Electron Beam Single-Track Scanning: Toward a New Approach for Fabricating TiNi Self-Healing Shape Memory Coating

et al. 2023

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The limited wear resistance of commercially pure titanium (CP-Ti) hinders its use in abrasive and erosive environments, despite its good strength–weight ratio and corrosion resistance. This paper reports the first study proposing a novel method for wear-resistant TiNi coating through Ni plating and electron beam (EB) irradiation in an in situ synthetic approach. Single-track melting experiments were conducted using the EB to investigate the feasibility of forming a TiNi phase by fusing the Ni plate with the CP-Ti substrate. Varying beam powers were employed at a fixed scanning speed to determine the optimal conditions for TiNi phase formation. The concentration of the melt region was found to be approximate as estimated from the ratio of the Ni-plate thickness to the depth of the melt region, and the region with Ni-48.7 at.% Ti was successfully formed by EB irradiation. The study suggests that the mixing of Ti atoms and Ni atoms was facilitated by fluid flow induced by Marangoni and thermal convections. It is proposed that a more uniform TiNi layer can be achieved through multi-track melting under appropriate conditions. This research demonstrates the feasibility of utilizing EB additive manufacturing as a coating method and the potential for developing TiNi coatings with shape memory effects and pseudoelasticity.

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Modeling stress-strain nonlinear mechanics via entropy changes on surface wetting using the Born-Oppenheimer approximation

Tan

Anariba

2022

Results in Engineering

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A low temperature in-situ crystalline TiNi shape memory thin film deposited by magnetron sputtering

Cited by 10 publications

References 28 publications

High-precision modeling of dynamic etching in high-power magnetron sputtering

High-precision modeling of dynamic etching in high-power magnetron sputtering

Fusion of Ni Plating on CP-Titanium by Electron Beam Single-Track Scanning: Toward a New Approach for Fabricating TiNi Self-Healing Shape Memory Coating

Modeling stress-strain nonlinear mechanics via entropy changes on surface wetting using the Born-Oppenheimer approximation

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