An efficient route to 1-formyl-1,2-dihydroquinolines 6 is described based on the BF3-catalyzed cyclization of o-(1-hydroxy-2-alkenyl)phenyl isocyanides 4, which can be prepared feasibly by the reaction of N-(o-acylphenyl)formamides 1 with alkenylmagnesium bromides 2 followed by treatment of the resulting hydroxy formamides 3 with phosphorous oxychloride.
The electrochemical formation of Nd-Ni alloys was investigated in a molten LiF-CaF 2-NdF 3 (0.30 mol%) system at 1123 K. Cyclic voltammetry and open-circuit potentiometry indicated the formation of several phases of Nd-Ni alloys. The whole electrode became almost NdNi 2 phase by potentiostatic electrolysis of a 0.2 mm-thick Ni plate at 0.15 V vs. Li + /Li for 75 minutes. The formed NdNi 2 electrodes were transformed to other phases such as NdNi 3 and NdNi 5. The existences of NdNi 2 , NdNi 3 and NdNi 5 were confirmed by powder XRD analysis. By summarizing the results, the formation potential for each alloy phase has been determined.
The electrochemical formation of Dy-Ni alloys was investigated in a molten LiF-CaF 2 -DyF 3 (0.30 mol%) system at 1123 K. Cyclic voltammetry and open-circuit potentiometry indicated the formation of several phases of Dy-Ni alloys. Potentiostatic electrolysis was conducted to prepare an alloy sample using a Ni-plate electrode at 0.20 V vs. Li + /Li for 120 min. Cross-sectional scanning electron microscopy revealed that the Ni plate was partially transformed into a Dy-Ni alloy. X-ray diffraction analysis confirmed that DyNi 2 was the predominant phase and DyNi 3 the minor phase in the alloy. When the electrolytic potential was kept at 0.45 V and 0.62 V for 110 min after electrolysis at 0.20 V for 130 min, the resultant phases were DyNi 3 and DyNi 5 , respectively. The formation potential for each Dy-Ni alloy phase was determined from the experimental results.
A new dendrimer (1), which contains phenol groups in the exterior for solubilization in
aqueous alkaline solution and calix[4]resorcinarene in the interior to increase the molecular
weight and number of the phenol group even in the lower generation, was designed as new
negative-working, alkaline-developable photoresist material. A negative-working photoresist
based on 1, 2,6-bis(hydroxymethyl)phenol as cross-linker, and diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate as a photoacid generator has been developed. This resist
gave a clear negative pattern through postbaking at 110 °C after exposure to UV light,
followed by developing with a 0.3% aqueous tetramethylammonium hydroxide solution at
room temperature.
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