Low surface energy polymeric release coating for improved contact print lithography

Mancini, David P.; Resnick, Douglas J.; Gehoski, Kathleen A.; Popovich, Laura L.; Chang, Daniel H.

doi:10.1117/12.458339

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2009

2024

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“…Teflon AF, a family of amorphous fluoropolymers, has very high optical transmission as well as low surface energy [1], low refractive index, and resistance to severe environments [2]. It has also been used as a release layer for both contact [3] and imprint [4] lithographies.…”

Section: Introductionmentioning

confidence: 99%

Direct Electron-Beam Patterning of Teflon AF

Karre

Keathley

Guo

et al. 2009

IEEE Trans. Nanotechnology

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Teflon AF thin films have been directly patterned by electron-beam lithography without the need for chemical development. The pattern depth was found to be linearly related to exposure dose and increases with increasing film thickness. Features as small as 200 nm have been resolved. Fourier transform infrared measurements indicate that the electron-beam-induced patterning is related to degradation of the fluorinated dioxole group present in amorphous Teflon.

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Section: Introductionmentioning

confidence: 99%