2016
DOI: 10.1109/led.2016.2609599
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Low ON-Resistance SiC Trench/Planar MOSFET With Reduced OFF-State Oxide Field and Low Gate Charges

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Cited by 74 publications
(22 citation statements)
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“…As shown in Figure 4, the transfer, breakdown and firstquadrant conduction characteristics of CoolMOS and proposed MOSFET are very close because the structural parameters of the active region of the two devices are basically the same. Since the source area of CoolMOS is larger, the R on,sp of CoolMOS is slightly smaller than that of the proposed MOSFET (2.01 mΩ⋅cm 2 for CoolMOS, 2.02 mΩ⋅cm 2 for proposed MOSFET). The threshold voltage V th of both devices is 4.3 V, and the breakdown voltage V BR of both devices is about 1425 V while the breakdown currents rise sharply.…”
Section: Figurementioning
confidence: 92%
“…As shown in Figure 4, the transfer, breakdown and firstquadrant conduction characteristics of CoolMOS and proposed MOSFET are very close because the structural parameters of the active region of the two devices are basically the same. Since the source area of CoolMOS is larger, the R on,sp of CoolMOS is slightly smaller than that of the proposed MOSFET (2.01 mΩ⋅cm 2 for CoolMOS, 2.02 mΩ⋅cm 2 for proposed MOSFET). The threshold voltage V th of both devices is 4.3 V, and the breakdown voltage V BR of both devices is about 1425 V while the breakdown currents rise sharply.…”
Section: Figurementioning
confidence: 92%
“…Therefore, the switching performances of the studied SiC JBS diodes are critical. In this paper, the test circuit in Figure 3a is adopted to study the switching properties of the SiC JBS diodes [23,24]. The studied SiC JBS diode is the device under test (DUT).…”
Section: Switching Performancesmentioning
confidence: 99%
“…Likewise, the contact via hole between the source metal and the dummy gate can be formed along with the formation of the source contact hole. To simulate SiC-based power devices, the following models are essential: anisotropic avalanche model based on the Chynoweth law [19] [20] used only for breakdown voltage simulations, incomplete ionization of dopants in SiC material, Shockley-Read-Hall (SRH) recombination with doping dependency, bandgap narrowing [21]- [23]. The parameters of the electron-and hole-impact ionization coefficients of 4H-SiC used in the simulations are given in Table I.…”
Section: Introductionmentioning
confidence: 99%