2016
DOI: 10.1002/pssa.201532957
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Interface passivation of liquid‐phase crystallized silicon on glass studied with high‐frequency capacitance–voltage measurements

Abstract: The passivation quality at the interface between dielectric interlayer (IL) stacks and liquid-phase crystallized silicon (LPC-Si) was investigated by means of high-frequency capacitance-voltage (C-V) measurements. The developed device structure was based on a molybdenum layer sandwiched between the glass substrate and the IL/LPC-Si stack. C-V curves were discussed in terms of hysteresis formation and capacitance relaxation. We varied the nitrogen and hydrogen content in the a-SiO x N y :H layer adjacent to the… Show more

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Cited by 11 publications
(18 citation statements)
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“…Capacitance–voltage ( C–V ) measurements revealed a high positive fixed charge density ( Q f ) of 1.4 · 10 12 cm −2 for a 20/100/80 nm SiN x /SiO x /SiO x N y LPC‐Si interlayer stack, which is similar to the values reported for SiN x :H layers on c‐Si wafers . On p‐type wafers, such Q f results in a charge inversion layer …”
Section: Introductionsupporting
confidence: 76%
See 1 more Smart Citation
“…Capacitance–voltage ( C–V ) measurements revealed a high positive fixed charge density ( Q f ) of 1.4 · 10 12 cm −2 for a 20/100/80 nm SiN x /SiO x /SiO x N y LPC‐Si interlayer stack, which is similar to the values reported for SiN x :H layers on c‐Si wafers . On p‐type wafers, such Q f results in a charge inversion layer …”
Section: Introductionsupporting
confidence: 76%
“…As input parameters we used the measured fixed charge density Q f = 1.4 (±0.4) × 10 12 cm −2 and defect density N it = 4 (±3) · 10 11 cm −2 , based on the C–V measurements in Ref. . In AFORS‐HET, a 1 nm c‐Si defect layer, with a defect density of 4 (±3) × 10 18 cm −3 was used to simulate N it .…”
Section: Collection Outside the Cell Areamentioning
confidence: 99%
“…After drying the substrates with N 2 , a sputtered SiO 2 diffusion barrier with a thickness of 200 nm was deposited on the glass. A 70 nm sputtered SiN x was added as a field passivation layer and an antireflective coating (in superstrate configuration). A final 10 nm sputtered SiO 2 was deposited to reduce surface recombination .…”
Section: Methodsmentioning
confidence: 99%
“…The impact of several parameters, e.g. optical design and defect passivation , on the solar cell performance have already been discussed. However the influence of the morphology of the multicrystalline Si thin‐films itself on the device characteristic remained so far unresolved.…”
Section: Introductionmentioning
confidence: 99%
“…So far, silicon oxide (abbreviated as SiO x ), silicon nitride (SiN x ), silicon oxynitride (SiO x N y ), silicon carbide (SiC x ), and aluminium oxide (Al 3 O 2 ) were used as interlayer material in LPC‐Si solar cells . The combination of these materials in multi‐layer stacks such as SiO x /SiN x /SiO x (O/N/O) or SiN x /SiO x /SiO x N y (N/O/ON) resulted in efficiencies of more than 13% (Figure ).…”
mentioning
confidence: 99%