2017
DOI: 10.1002/solr.201700100
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Influence of the Frontside Charge Inversion Layer on the Minority Carrier Collection in Backside Contacted Liquid Phase Crystallized Silicon on Glass Solar Cells

Abstract: External quantum efficiency and light beam induced current measurements were used to investigate backside contacted solar cells made on p‐type, liquid phase crystallized silicon on glass (LPC‐Si). Among other differences, these cells had either a SiOxNy or an Al2O3/SiO2 based frontside surface passivation (interlayer). From the measurements it was observed that the cell with the SiOxNy interlayer showed a charge carrier collection from below the absorber contact and from outside the cell area that is much larg… Show more

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“…Apart from passivating the buried LPC‐Si surface toward the glass substrate, the ILs need to prevent dewetting of the absorber during crystallization, they have to impede impurity diffusion from the glass into the silicon, and they should enhance light coupling into the absorber when illuminating the cell through the glass side. To meet all these requirements, multi‐layer stacks based on, for example, amorphous silicon oxide (SiO x ), amorphous silicon nitride (SiN x ), amorphous silicon oxynitride (SiO x N y ), amorphous silicon carbide (SiC x ), and aluminum oxide (AlO x ) deposited by using plasma‐enhanced chemical vapor deposition (PECVD), reactive RF‐magnetron sputtering (PVD), or atomic layer deposition (ALD) were successfully integrated into LPC‐Si solar cells.…”
Section: Introductionmentioning
confidence: 99%
“…Apart from passivating the buried LPC‐Si surface toward the glass substrate, the ILs need to prevent dewetting of the absorber during crystallization, they have to impede impurity diffusion from the glass into the silicon, and they should enhance light coupling into the absorber when illuminating the cell through the glass side. To meet all these requirements, multi‐layer stacks based on, for example, amorphous silicon oxide (SiO x ), amorphous silicon nitride (SiN x ), amorphous silicon oxynitride (SiO x N y ), amorphous silicon carbide (SiC x ), and aluminum oxide (AlO x ) deposited by using plasma‐enhanced chemical vapor deposition (PECVD), reactive RF‐magnetron sputtering (PVD), or atomic layer deposition (ALD) were successfully integrated into LPC‐Si solar cells.…”
Section: Introductionmentioning
confidence: 99%