2012
DOI: 10.1109/tns.2012.2224377
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Initial Assessment of the Effects of Radiation on the Electrical Characteristics of ${\rm TaO}_{\rm x}$ Memristive Memories

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Cited by 70 publications
(53 citation statements)
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“…Finally, we note that NbO x and TaO x , in their high resistive states, have rather small carrier concentrations, on the order of 10 16 -10 17 cm −3 [19]- [21]. At a similar dose of 0.6 Mrad(NbO 2 ), NbO x devices have shown 7.1% change in V H , 50% change in I H , and 78.5% change in R H [22].…”
Section: Discussionmentioning
confidence: 79%
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“…Finally, we note that NbO x and TaO x , in their high resistive states, have rather small carrier concentrations, on the order of 10 16 -10 17 cm −3 [19]- [21]. At a similar dose of 0.6 Mrad(NbO 2 ), NbO x devices have shown 7.1% change in V H , 50% change in I H , and 78.5% change in R H [22].…”
Section: Discussionmentioning
confidence: 79%
“…At a similar dose of 0.6 Mrad(NbO 2 ), NbO x devices have shown 7.1% change in V H , 50% change in I H , and 78.5% change in R H [22]. In TaO x devices, just 10 krad(SiO 2 ) irradiation flipped the OFF (high resistance) state to ON (low resistance) state with a 100-fold decrease in resistance in [21]. On the other hand, HfO 2 -based resistive memory elements have carrier densities of ∼10 20 cm −3 in their conductive state [23], and have been demonstrated to be quite tolerant to TID exposure above 1 Mrad(SiO 2 ) [24], consistent with this interpretation.…”
Section: Discussionmentioning
confidence: 99%
“…In VCM, there are three main materials that have been the focus of research to date; TaO x , HfO x , and TiO x although some research into SiO x has also been conducted [92]- [94], [96], [99], [101]- [109]. Over the years, variations in radiation responses between different or even the same materials has been reported.…”
Section: Resistive Random Access Memorymentioning
confidence: 99%
“…A large amount of work, however, does report radiation effects in VCM memory at high doses which include changes in voltages, resistance, and in some cases, a complete switch of state [92], [93], [96], [102], [103], [106], [109], [111]- [114]. In these cases, it is thought that the induced charge and oxygen vacancies interfere with the conductive filament switching mechanism and/or the resistance of the oxide.…”
Section: Resistive Random Access Memorymentioning
confidence: 99%
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