Influence of substrate properties on the growth of titanium films: part IV

Poppeller, M.; Abermann, R.

doi:10.1016/s0040-6090(03)00529-7

Cited by 9 publications

(2 citation statements)

References 30 publications

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“…11 Further, after the sputtered cluster coalescence and an uninterrupted coating formed, the thicker the coating, the more compact structure and the higher growth stress is. 12 As a result of higher internal residual stress in thicker coatings, the film reliability is decreased. Because it may induce micron cracks on the surface of film leading to relaxation of deposition-induced internal stresses, as shown in Fig 6. …”

Section: Sem Observationsmentioning

confidence: 99%

Structures and properties of the polyester nonwovens coated with titanium dioxide by reactive sputtering

et al. 2010

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Nanoscale titanium dioxide (TiO 2 ) films were deposited on the surface of polyester nonwovens by using direct current (DC) reactive magnetron sputtering. The effect of coating thickness on the surface structures and properties of TiO 2 coated fabrics was investigated by atomic force microscope (AFM), X-ray diffraction (XRD), energy dispersive X-ray analysis system (EDX), scanning electron microscope (SEM), and antistatic test in this article. The results indicated that the grain sizes of the sputtered clusters increased and the coating layer became more compact as film thickness was increased, but the crystal structure did not have any significant change. At the same time, the film mechanical properties and antistatic performance in general depended strongly on the film thickness which could lead to the optimum thickness for a particular application.

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Section: Sem Observationsmentioning

confidence: 99%

Structures and properties of the polyester nonwovens coated with titanium dioxide by reactive sputtering

et al. 2010

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“…It is an importance optical film material. TiO 2 films have been produced by several methods such as sol-gel method [3], magnetron sputtering [4,5], Ion-beam assisted deposit technique [6], and so on. There are different optics and stress by different deposit techniques.…”

Section: Introductionmentioning

confidence: 99%

Study of Stress in TiO<sub>2</sub> Films Grown by Electron-Beam Evaporation

Chen

Wang

Xiong

2011

AMR

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TiO2 films were fabricated on Si substrate by using electron-beam gun evaporation. Influence of deposition rate, deposition temperature and ion beam bombarding on stress in TiO2 films was studied by AFM and XRD. The results show that deposition temperature of 423K and deposition rate of 0.2nm/s, the average stress in titanium oxide thin films is less than 48.2MPa. The average stress decreases to compressive stress of 16.7MPa from tensile stress of 72.9MPa by the ion beam energy of 113eV and bombarding time of 300s. The microstructure change of TiO2 films is main factors of stress development.

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