Influence of substrate bias voltage on the properties of TiO 2 deposited by radio-frequency magnetron sputtering on 304L for biomaterials applications

Bait, L.; Azzouz, Lakhdar; Madaoui, N.; Saoula, Nadia

doi:10.1016/j.apsusc.2016.07.101

Cited by 39 publications

(21 citation statements)

References 34 publications

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“…Thus, it is clear that such coatings are not appropriate for implant manufacturing. After the EBT of Co-Cr substrate, the hardness of TiN/TiO 2 coating was reduced to 5 GPa, which is in agreement with the results published in [45] and is comparable with the measured values for human teeth [46].…”

Section: Ebtsupporting

confidence: 91%

Influence of Electron Beam Treatment of Co–Cr Alloy on the Growing Mechanism, Surface Topography, and Mechanical Properties of Deposited TiN/TiO2 Coatings

et al. 2019

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This study examines the effect of electron beam treatment (EBT) of Co-Cr substrate on the film growth mechanism, mechanical properties, and surface topography of TiN/TiO 2 coatings deposited by reactive magnetron sputtering. The obtained results and processes that occurred during the deposition are discussed in the context of crystallographic principles, and special attention is paid to the crystallographic orientation and growth mechanism studied by X-ray diffraction (XRD). The mechanical properties were investigated by means of nanoindentation and wear tests. The surface topography was evaluated using atomic force microscopy (AFM). The results obtained in the present study showed that polycrystalline TiN and anatase TiO 2 phases were present in all cases. Electron beam treatment of Co-Cr substrate tended to form a reorientation of the microvolumes from (111) to (200) of TiN, leading to a change in the growth mechanism from three-dimensional (Volmer-Weber) to layer-by-layer (Frank-van der Merwe). It was found that the electron beam treatment process did not significantly affect the thickness of the coatings and the deposition rate. The treatment process led to an increase in surface roughness. The higher surface roughness after the EBT process should be appropriate to support cell growth and adhesion on the surface of the deposited bilayer coating. It was demonstrated that EBT of the substrate caused a decrease in hardness of the deposited coatings from 10 to 5 GPa. The observed decrease in hardness was attributed to the change in the preferred crystallographic orientation and film growth mechanism. The hardness of the bilayer coating after the application of EBT of the Co-Cr substrate was much closer to that of human bones, which means that severe stress shielding effect could not be expected. The evaluated coefficient of friction (COF) exhibited significantly lower values in the case of EBT of the substrate compared to the untreated Co-Cr material.resistance, which depends mostly on the surface properties and can be overcome by appropriate surface modification technologies [4].During the last decades, considerable attention has been paid to surface manufacturing of materials by high-energy fluxes (HEFs) (i.e., electron and laser beams). In these technologies, the electrons or photon fluxes interact with the surface of the sample, heat the treated area, and form a thermal distribution. The rate of heating and cooling can be characterized by quite high values (about 10 5 -10 6 K/s), which lead to some structural changes in the functional properties [5][6][7][8][9][10]. The authors of [11] demonstrated an innovative approach for controlling the surface topography and tribological behavior of biomedical alloys, such as Ti6Al4V, by means of electron beam surface treatment. Other researchers [12,13] have successfully demonstrated the possibilities for enhancing the wear and corrosion properties of steel by the formation of carbon fiber-reinforced Ni-based composite coatings via laser cladding. Laser beam technologie...

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Section: Ebtsupporting

confidence: 91%

Influence of Electron Beam Treatment of Co–Cr Alloy on the Growing Mechanism, Surface Topography, and Mechanical Properties of Deposited TiN/TiO2 Coatings

et al. 2019

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“…In previous works, TiO 2 depositions, either by RF [2] or DC [17,35] magnetron sputtering, were amorphous in continuous gas flow, if no bias voltage or heating was applied to the substrate. Crystalline TiO 2 (anatase, rutile or a mixture of both) was obtained either by controlling the O 2 flow and sputtering pressure [36,37], by applying a substrate bias voltage [3,17,38], or by annealing [39][40][41]. Nezar et al [26] managed to obtain crystalline TiO 2 by reactive magnetron sputtering without applying any substrate bias at RT, with predominantly anatase phase ( Table 4).…”

Section: Discussionmentioning

confidence: 99%

“…Substrate temperature has a role in activating the surface and allowing adatoms to diffuse and occupy the vacancies in the film. Substrate bias also influences the diffusion of adatoms not only by the surface diffusion energy, but also by increasing the kinetic energies of incoming ions [3,38]. The power of the discharge plays a big part as well: By increasing it to a certain point we can maximize the sputtering yield.…”

Section: Discussionmentioning

confidence: 99%

“…Titanium dioxide (TiO 2 ) thin films play a significant role in different areas of research and may lead to promising applications, due to its very good optical and electrical properties, high chemical stability and non-toxic nature. Over the years, TiO 2 has been studied for many potential applications, including as a coating for self-cleaning surfaces, the white pigment in paints and food coloring, solar cells [1], biomaterials applications [2,3], as a material for corrosion resistance [4][5][6][7][8][9][10], and gas sensing [11,12]. TiO 2 can be deposited through various methods [13] such as chemical vapor deposition (CVD), pulsed laser deposition (PLD), electrophoretic deposition (EPD), magnetron sputtering (MS), and sol-gel dip-coating.…”

Section: Introductionmentioning

confidence: 99%

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RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate

et al. 2019

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Rutile titanium oxide (TiO 2 ) thin films require more energy to crystallize than the anatase phase of TiO 2 . It is a prime candidate for micro-optoelectronics and is usually obtained either by high substrate temperature, applying a substrate bias, pulsed gas flow to modify the pressure, or ex situ annealing. In the present work, we managed to obtain high enough energy at the substrate in order for the particles to form rutile TiO 2 at room temperature without any intentional substrate bias in a continuous gas flow. The rutile TiO 2 thin films were deposited by a reactive radiofrequency magnetron sputtering system from a titanium target, in an argon/oxygen gas mixture. Investigations regarding the film's structure and morphology were performed by X-ray diffraction (XRD), X-ray reflectivity (XRR), scanning electron microscopy (SEM) and energy-dispersive X-ray spectroscopy (EDAX), while the optical properties were investigated by means of ellipsometry.

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“…For the moment, there is no evidence of the effect of the mechanical properties on the electrical characteristics of the diodes, such as series resistance, current density, or Schottky barrier height. Nevertheless, several studies attest to the impact of the bias voltage on the Young's modulus and hardness of the deposited metallic layers,…”

Section: Resultsmentioning

confidence: 99%

Mechanical Behavior and Adhesion of the Ti/Cr/Au Metallization Scheme on Diamond Substrate

2017

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The mechanical properties of a Ti/Cr/Au metallization system deposited on a heavily doped diamond substrate are evaluated, first using nano‐indentation tests. Various kinds of conditions are adopted, such as small and high force loadings. These tests are completed by in situ scanning electron microscopy observations of the surface. The adhesion of such multilayer on the diamond substrate is assessed using nano‐scratching tests. The profiles of the obtained scratches are analyzed to detect any singularities or defects. Finally, a cross‐section topography is performed, in order to obtain the cross profile of the scratch, and to determine the scratch hardness parameter of the metallization system. The Ti/Cr/Au metallization system is a potential candidate to play the role of ohmic contact on diamond. Therefore, its adhesion to diamond is important, since the whole power electronic assembly is mainly subjected to thermal cycling during service. The metallization system must adhere well to diamond, so as to resist temperature gradients and thermal strains that are widely observed in extreme thermal conditions. Otherwise, debonding phenomena may occur, and the whole electronic packaging fail.

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Influence of substrate bias voltage on the properties of TiO 2 deposited by radio-frequency magnetron sputtering on 304L for biomaterials applications

Cited by 39 publications

References 34 publications

Influence of Electron Beam Treatment of Co–Cr Alloy on the Growing Mechanism, Surface Topography, and Mechanical Properties of Deposited TiN/TiO2 Coatings

Influence of Electron Beam Treatment of Co–Cr Alloy on the Growing Mechanism, Surface Topography, and Mechanical Properties of Deposited TiN/TiO2 Coatings

RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate

Mechanical Behavior and Adhesion of the Ti/Cr/Au Metallization Scheme on Diamond Substrate

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