2019
DOI: 10.3390/coatings9070442
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RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate

Abstract: Rutile titanium oxide (TiO 2 ) thin films require more energy to crystallize than the anatase phase of TiO 2 . It is a prime candidate for micro-optoelectronics and is usually obtained either by high substrate temperature, applying a substrate bias, pulsed gas flow to modify the pressure, or ex situ annealing. In the present work, we managed to obtain high enough energy at the substrate in order for the particles to form rutile TiO 2 at room temperature without any intentional substrate bias in a continuous ga… Show more

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Cited by 46 publications
(14 citation statements)
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References 42 publications
(63 reference statements)
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“…Remarkably, an increased catalyst concentration (HCL + AcAc for the case of TiO 2 film) has resulted in the higher refractive index value '2.6' . Similarly, Simionescu et al obtained the higher refractive www.nature.com/scientificreports/ index value '2.7' of the sputtered TiO 2 film, and assigned to the presence of mixed anatase and rutile phases 25 . Accordingly, we can also observe the appearance of rutile peaks at 2θ = 27.44°, 41.22°, and 44° corresponding to the planes (110), (111), and (210) in addition to the anatase peaks as shown in Fig.…”
Section: Resultsmentioning
confidence: 88%
“…Remarkably, an increased catalyst concentration (HCL + AcAc for the case of TiO 2 film) has resulted in the higher refractive index value '2.6' . Similarly, Simionescu et al obtained the higher refractive www.nature.com/scientificreports/ index value '2.7' of the sputtered TiO 2 film, and assigned to the presence of mixed anatase and rutile phases 25 . Accordingly, we can also observe the appearance of rutile peaks at 2θ = 27.44°, 41.22°, and 44° corresponding to the planes (110), (111), and (210) in addition to the anatase peaks as shown in Fig.…”
Section: Resultsmentioning
confidence: 88%
“…It is noticed that almost all samples except the 16 μm samples showed higher adhesion rate compared with flat sample. The reason was not explained but could be that the radio frequency (RF) sputtering deposited TiO 2 surface could has small roughness [ 65 ] which might reduce the adhesion of platelets. In summary, the nanopillar surface can be designed to control platelet adhesion, indicating the possibility of application for stent surface topography.…”
Section: Effects Of Topography and Surface Chemistry On Stentsmentioning
confidence: 99%
“…This technique allows the deposition of oxide compound films by introducing oxygen (O 2 ) gas into the plasma, which is typically formed by an inert gas such as argon (Ar). [33][34][35][36] Besides, the method can easily adjust the deposition parameters and offers a high deposition rate for large-scale production.…”
Section: Introductionmentioning
confidence: 99%
“…However, the direct current (DC) magnetron sputtering method has many advantages such as good control over the composition and structure of the films, extremely high film‐substrate adhesion, excellent uniformity on large‐area substrates, and the ability to coat heat‐sensitive substrates. This technique allows the deposition of oxide compound films by introducing oxygen (O 2 ) gas into the plasma, which is typically formed by an inert gas such as argon (Ar) 33–36 . Besides, the method can easily adjust the deposition parameters and offers a high deposition rate for large‐scale production.…”
Section: Introductionmentioning
confidence: 99%