Influence of film-growth conditions on c-axis orientation in sputtered Co-Cr thin films

Abstract

Double- and multiple-layered Co-Cr thin films have been prepared to clarify the dominant factors in the c-axis orientation at the early stage of the film growth. The optimized process condition in the facing-targets sputtering system is likely to promote the c-axis self-orientation in the films since they can grow on the plasma-bombardment-free substrate. This effect was confirmed by depositing the films on the poorly oriented Co-Cr film as the underlayer. Meanwhile, when the well-oriented Co-Cr thin film was used as the underlayer, a continuous growth of crystallites resulted in the improvement of the c-axis orientation in the growing film even under process conditions unfavorable for depositing the well-oriented films. This Co-Cr underlayer effect continues until the thickness of the depositing film reaches about 2000 Å, suppressing the influence of the unfavorable sputtering condition.

Deposition of Co-Cr films with large magnetization on polyethylene naphthalate tape

“…5 ,6 Figure 4 shows the underlayer thickness dependence of the x-ray diffraction intensity lp of (002) planes and the average grain size (D) OfCoS3Crl7/C07yCr21 films. 5 ,6 Figure 4 shows the underlayer thickness dependence of the x-ray diffraction intensity lp of (002) planes and the average grain size (D) OfCoS3Crl7/C07yCr21 films.…”

Soft Magnetism and Micro-Structure of Iron Films by Ion Beam Sputtering

“…Recently, the preparation of films with such a high 4TIMs has become of major interest for the magnetic layer of thih film heads or the soft magnetic under l~er in perpendicular recording medium. [1] However, the films deposited by sputtering from iron targets do not show always the magnetic properties same as bulk iron. [2,3] Especially, the coercivity Hc of films is apt to be affected remarkably by preparation conditions.…”