1992
DOI: 10.1016/0168-583x(92)95160-s
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Induced damage by high energy heavy ion irradiation at the GANIL accelerator in semiconductor materials

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Cited by 108 publications
(28 citation statements)
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“…Now at the MS interface the S n value is 0.10 keV nm −1 while S e is 20.4 keV nm −1 (in the GaN substrate). It is well established that S n causes creation of defects such as vacancies and interstitials at the interfaces [12] which leads to an increase in the interface state density D s . SHI irradiation results in the introduction of interface states at MS interface which influence the SBH [14][15].…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Now at the MS interface the S n value is 0.10 keV nm −1 while S e is 20.4 keV nm −1 (in the GaN substrate). It is well established that S n causes creation of defects such as vacancies and interstitials at the interfaces [12] which leads to an increase in the interface state density D s . SHI irradiation results in the introduction of interface states at MS interface which influence the SBH [14][15].…”
Section: Resultsmentioning
confidence: 99%
“…1 shows the forward I-V characteristics of the Au/n-GaN Schottky diode for the pristine as well as irradiated samples with the varying fluences from 5 × 10 9 ions cm −2 to 5 × 10 11 ions cm −2 . The experimental data are fitted with the thermionic emission equation, which is given by [12] …”
Section: Methodsmentioning
confidence: 99%
“…Track registration is common but not systematic in iono-covalent insulators [14][15][16]. In crystalline semiconductors, ion tracks have been observed by TEM in InSb, InP, GeS, InAs, GaSb, SiGe, and Ge [17][18][19][20][21][22][23] irradiated with SHI, whereas no track was found in GaAs [21] or Si [24,25]. Moreover, at least in InP and GaAs, ion tracks are also formed below S th e if the materials have been previously damaged [26].…”
Section: Introductionmentioning
confidence: 97%
“…SHII with single ions is thus an inefficient means of forming ion tracks in c-Si. 26,27 In contrast, a much greater rate of electronic energy loss ͑Ͼ25 keV/ nm͒ can be attained with C 60 cluster ion irradiation 25,28 which overcomes the weak electron-phonon coupling in c-Si and ion track formation can be achieved.…”
Section: Resultsmentioning
confidence: 99%