In-situ wafer temperature measurement during firing process via inline infrared thermography

Ourinson, Daniel; Emanuel, G.; Csordás, Attila; Dammaß, Gunnar; Müller, Harald J. W.; Sternkiker, Christoph; Clement, Florian; Glunz, Stefan W.

doi:10.1063/1.5125878

Cited by 1 publication

(1 citation statement)

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“…To record these profiles, one cell of each group was fired while being attached to a frame. This allows for a thermocouple anchored at the frame to press against the centre of the cell by spring force, as can be seen in Figure 3a in this paper by Ourinson et al 22 The thermocouple has a wire connection to a data logger to record the measured data. The datalogger is placed into a thermal shield box for heat protection during the firing process.…”

Section: Methodsmentioning

confidence: 99%

LeTID mitigation via an adapted firing process in p‐type PERC cells from SMART cast‐monocrystalline, Czochralski and high‐performance multicrystalline silicon

Maischner

Maus

Greulich

et al. 2021

Progress in Photovoltaics

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In this work, we analyse passivated emitter and rear cells (PERC), based on wafers made from seed manipulation for artificially controlled defects technique (SMART) monocrystalline silicon, magnetically grown and conventional Czochralski (mCz and Cz) silicon, and high‐performance multicrystalline (hpm) silicon. All wafers were processed identically except for the hpm wafers, which received an acidic texture instead of random pyramids. The energy conversion efficiency η of the SMART cells of 21.4 % is similar to the mCz cells (21.5 %) while being more than 1.90.1em%abs higher than for the hpm cells. Furthermore, we here show for the first time that light‐ and elevated temperature‐induced degradation (LeTID) is mitigated in hpm, Cz and SMART PERC cells without significant losses in initial efficiency by an adapted fast‐firing process, incorporating slower firing ramps that can be used in industrial production. The cells that are fired with these ramps show no significant efficiency loss ( 10.1em%rel

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Section: Methodsmentioning

confidence: 99%