1992
DOI: 10.1063/1.108124
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Improved ohmic contacts for p-type ZnSe and related p-on-n diode structures

Abstract: The problem of obtaining ohmic contacts for p-type ZnSe is related to the deep valence band of ZnSe. We have addressed this problem by employing an epitaxial layer of the semimetal HgSe to decrease the interfacial energy barrier, or valence band offset, to about 0.6 eV. This has resulted in improved ohmic contacts for p-type ZnSe films and related diode structures.

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Cited by 91 publications
(20 citation statements)
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“…The dashed line is the expected behavior, calculated using the method and parameters published for bulk HgSe [13]. Assuming that the band structure parameters are correct, the deviation for MBE grown HgSe can be explained by (1) postulating more than one type of charge carriers, (2) assuming a temperature dependence for the aonor concentration, or (3) supposing different scattering mechanisms which would change the carrier concentration as calculated from the experimental Hall constant. At present none of these explanations could be shown to be the correct one.…”
Section: IVmentioning
confidence: 99%
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“…The dashed line is the expected behavior, calculated using the method and parameters published for bulk HgSe [13]. Assuming that the band structure parameters are correct, the deviation for MBE grown HgSe can be explained by (1) postulating more than one type of charge carriers, (2) assuming a temperature dependence for the aonor concentration, or (3) supposing different scattering mechanisms which would change the carrier concentration as calculated from the experimental Hall constant. At present none of these explanations could be shown to be the correct one.…”
Section: IVmentioning
confidence: 99%
“…Until now very few publications concerning this matter have appeared in the literature [1,4]. In this article, characteristics of MBE growth of HgSe are presented and their influence on structural and electrical properties of the resulting epilayers are discussed.…”
Section: Introductionmentioning
confidence: 99%
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