Improved CVD diamond coatings on WC–Co tool substrates

Makala, Raghuveer S.; Yoganand, S. N.; Jagannadham, K.; Lemaster, Richard L.; Bailey, John

doi:10.1016/s0043-1648(02)00244-2

Cited by 49 publications

(16 citation statements)

References 10 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…The surface of the substrate was subjected to hydrogen plasma for 2 h at a microwave power of 900 W, a pressure of 35 Torr, and a hydrogen flow rate of 60 sccm, in a microwave plasma system. Specifically, the hydrogen plasma treatment decarburized the WC-Co substrate to tungsten [2]. This step was intended to embed particles in the substrate for seeding diamonds, increase surface roughness, and enhance the adhesion of the diamond film.…”

Section: Substrate Pretreatmentmentioning

confidence: 99%

“…Cemented carbides are often applied to cutting tools, rotary tools, and various wear-resistant components [1,2], while diamond films deposited on cemented carbides by CVD can significantly prolong the lifespan of tools. Unfortunately, diamond films adhere poorly to the surface of sintered cobalt-cemented tungsten carbide (WC-Co) substrates, requiring manufacturers to use cobalt as a binder.…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Enhancing the adhesion of diamond films on cobalt-cemented tungsten carbide substrate using tungsten particles via MPCVD system

Lai

Chang

et al. 2011

Journal of Alloys and Compounds

View full text Add to dashboard Cite

Section: Substrate Pretreatmentmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Enhancing the adhesion of diamond films on cobalt-cemented tungsten carbide substrate using tungsten particles via MPCVD system

Lai

Chang

et al. 2011

Journal of Alloys and Compounds

View full text Add to dashboard Cite

“…Improvement of the film‐substrate adhesion may be achieved by preventing any interaction between cobalt and carbon species at the initial stages of exposure to the CVD environment. This may be done by conditioning of the substrate prior to the CVD process, either by depleting the cobalt concentration at the substrate surface 8–11 or by using an appropriate interlayer 12–16. While cobalt depletion avoids its influence on the CVD process it results in embrittlement of the WC‐Co substrate 12.…”

Section: Introductionmentioning

confidence: 99%

Cobalt out‐diffusion and carbon phase composition at the WC‐10%Co/diamond film interface investigated by XPS, SEM, Raman and SIMS

Hojman

Akhvlediani

Alagem

et al. 2012

Physica Status Solidi (a)

View full text Add to dashboard Cite

The effect of cobalt out‐diffusion from the WC‐10%Co/diamond film interface towards the diamond film surface, in terms of carbon phase, chemical composition and dependence of pre‐treatment for enhancement of diamond formation was investigated. Diamond films of various thicknesses were deposited onto substrates pre‐treated by a dual step process consisting of carburization and subsequently diamond seeding or just diamond seeding. Our findings show that the dual step pre‐treatment promotes diamond formation at the initial stages of deposition, decreases the content of out‐diffusing cobalt and prevents self‐delamination after 360 min of diamond film deposition. Conversely, delamination occurs after this deposition time from substrates pre‐treated by seeding only. Under our deposition conditions aggregation of cobalt at the diamond film surface occurs and a nearly constant concentration was measured irrespective of deposition time, along with depletion of cobalt from the diamond film‐substrate near interface region. The composition at the delaminated interface includes a high content of sp2 bonded carbon and a low content of cobalt, which point out that poor adhesion of diamond films to WC‐10%Co is influenced by the out‐diffusion of cobalt and formation of a graphitic interlayer, mainly at the initial stages of diamond film formation.

show abstract

“…Os carbetos podem ser preparados com ângulos de corte apropriados, necessários para conferir melhor qualidade de acabamento da superfície comparativamente aos PCDs. Nos últimos dez anos, muitos trabalhos foram realizados nesta área, resultando em um aumento na vida útil das ferramentas através de recobrimentos protetores obtidos através de nitretação, deposição de carbetos e filmes de diamante [6][7][8][9][10][11][12][13][14][15][16][17][18][19]. Apesar do amplo uso de recobrimentos duros do tipo PVD (Physical Vapor Deposition) e CVD (Chemical Vapor Deposition) para aumentar a resistência à abrasão de ferramentas de corte, até o presente momento, eles não têm sido utilizados na área de usinagem da madeira em escala industrial devido, principalmente, ao problema da aderência.…”

Section: Introductionunclassified