Imprintability of polymers for thermal nanoimprint

Scheer, Hella-Christin; Bogdanski, N.; Wissen, M.; Möllenbeck, Saskia

doi:10.1016/j.mee.2007.12.025

Cited by 14 publications

(13 citation statements)

References 10 publications

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“…͑7͒ when the parameters c 1 and c 2 are equal to 12.44 and 70.32 K, respectively, in fair agreement with values proposed by other authors. 28,29 These results demonstrate that our simple experimental approach is fully compatible with viscosimetry measurement methods and give access to quantitative data about the flow behavior of polymer in the sub-100-nm film thickness regime. We show previously that the decay time was easily determined from a significant height decrease of reflowed patterns ͑Fig.…”

Section: Resultsmentioning

confidence: 55%

Thin polymer films viscosity measurements from nanopatterning method

Leveder

Landis

Chaix

et al. 2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Polystyrene films, with thickness ranging from a few tens of nanometers up to several hundreds of nanometers and molecular weight of 27.5 kg mol−1, were patterned with nanoimprint lithography (NIL) technique. A rigid silicon stamp containing nanoscale features was printed into a thin spin coated polystyrene film. Then these patterns were annealed above the glass transition temperature in order to characterize the viscous reflow of the topography. Special attention was paid to provide, at initial times, imprinted nanoscale patterns with a very small aspect ratio and amplitude/wavelength as well as to avoid the nucleation of holes during imprinting or during the course of the reflow. This allowed the authors to process topography data with a high degree of accuracy from a linear viscous stability model. Atomic force microscopy measurements, with a spatial resolution lower than 1 nm, were used to characterize smooth or steep shapes. The mechanical measurements of earlier stages of pattern reflow were directly accessible without any assumption, contrary to the diffraction method usually employed. Our results clearly demonstrate that even the earliest stages of pattern reflow are driven by simple viscous effects and that relaxation dynamics, which is usually considered as following exponential laws, could be more complex. This article also demonstrates that the NIL process can be used for viscosity measurements for ultrathin resist film.

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Section: Resultsmentioning

confidence: 55%

Thin polymer films viscosity measurements from nanopatterning method

Leveder

Landis

Chaix

et al. 2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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“…Polystyrene (PS) and polymethylmethacrylate (PMMA) are very famous resists for the thermal nanoimprint lithography (T-NIL) [2]. Recently, directed self-assembly (DSA) lithography is one of the powerful candidates for nano pattern fabrication around 10 nm [3,4].…”

Section: Introductionmentioning

confidence: 99%

High Selective Plasma Etching of PMMA to PS

Shimomukai

Kawata

Yasuda

et al. 2015

J. Photopol. Sci. Technol.

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Polymethylmethacrylate (PMMA) and polystyrene (PS) are important materials for nano pattern fabrication processes such as the directed self-assembly (DSA) lithography. In this paper, the high selective etching of PMMA to PS films is presented by use of O 2 + C 4 F 8 mixed gas plasmas. Although both etch rates for the PS and PMMA films decrease by increasing the C 4 F 8 content, the PS etch rate decreases faster than the PMMA one. The etching selectivity reaches to 6 when the C 4 F 8 content is 65 %. The aspect ratio of nano pattern is enhanced by use of the high selective PMMA etching. The 250 nm depth trench pattern of the 80 nm width is successfully obtained from the 80 nm depth trench pattern.

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“…In contrast to the research shown with EBL patterning alone, the successful combination of thermal reflow with structures patterned by NIL and EBL was possible by using a resist with a molecular weight suitable for both lithography techniques. [9][10][11] Since large-area imprints are subsequently complemented with specific 3D pattern showing sloped and vertical sidewalls, the process combination is especially interesting for the stamp manufacture of the complex master pattern needed for the high volume production of mixed 3D structures based on replication techniques.…”

Section: Introductionmentioning

confidence: 99%

Combining nanoimprint lithography and a molecular weight selective thermal reflow for the generation of mixed 3D structures

Schleunitz

Spreu

Vogler

et al. 2011

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Sloped and stepped 3D structures were added to surface-patterned resists using grey-scale electron beam lithography and thermal reflow. A poly(methyl methacrylate) resist with moderate initial molecular weight of 120 kg/mol was chosen, which enabled processing with both nanoimprint and electron beam lithography. Using proper exposure doses, a molecular weight distribution was generated that allowed a selective thermal postprocessing of the exposed steps while the imprinted gratings on top of the resist were preserved. This allows fabricating mixed structures of microprisms surrounded by large-area nanogratings in the same resist layer. Working stamps were casted from the template pattern and subsequently replicated using thermal nanoimprint. As a possible application, backlight devices with arrays of light outcoupling prisms can be seen. V

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Imprintability of polymers for thermal nanoimprint

Cited by 14 publications

References 10 publications

Thin polymer films viscosity measurements from nanopatterning method

Thin polymer films viscosity measurements from nanopatterning method

High Selective Plasma Etching of PMMA to PS

Combining nanoimprint lithography and a molecular weight selective thermal reflow for the generation of mixed 3D structures

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