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We investigate low temperature nanoimprint into polymers, where adequate pressure choice helps to increase the imprint velocity of larger patterns und thus decreases pattern size effects by reduction of the effective viscosity. In order to make use of shear rate effects, the imprint has to be performed within the viscoelastic plateau region and not in the viscous flow regime of the polymer. Therefore elastic effects play an important role and may lead to shape recovery of the polymer after imprint. We address the counter play of elastic effects and viscous flow by conducting experiments very near to the glass transition temperature. The elastic behavior at the beginning of the imprint is simulated for different pattern sizes and thus different aspect ratios of the stamp. The investigations show, that a reduction of temperature has to be compensated by an increased imprint time and this time increase has to consider the reduction of viscosity on the one hand and the extension of the polymer flow time constants on the other hand. The experiments are suitable to define a lower limit for utilization of shear thinning effects.

Thermal imprint into polymer layers that are thin compared to the pattern height allows for imprints with extremely low and uniform residual layers where lift-off works without previous dry etching. The authors report about possible restrictions of this method such as unintended self-assembling and recovery of polymer underneath the imprinted structures. Both can be attributed to structure size properties and temperature influence and hinder a subsequent successful lift-off. Taking the example of two different temperatures and two different initial layer thicknesses the authors investigate their impact on the resulting structure shape and potential defects. In addition, to qualitatively estimate the residual layer thickness the authors apply lift-off and discuss the results with focus on the usability of this approach as a lithography technique.