Impact of Dimensional Scaling and Size Effects on Spin Transport in Copper and Aluminum Interconnects

Impact of dimensional scaling and size effects on beyond CMOS All-Spin Logic interconnects

“…Hence, spin relaxation time is proportional to momentum relaxation time, which gets shorter as interconnect cross-sectional dimensions become smaller, due to size effects. The models for spin relaxation time and spin diffusion length are presented in [2] and Fig. 2 shows how spin relaxation length decreases as interconnect dimensions scale.…”

“…Various materials are suggested to be used to implement the channel in ASL such as metals (Cu and Al), semiconductors (Si and GaAs), and even novel carbon-based material such as grapheme [2]. Metals have a great advantage due to their high conductivity which helps to reduce the "conductivity mismatch" problem prevalent in spin devices with both semiconducting and graphene channels [9].…”

“…Metals have a great advantage due to their high conductivity which helps to reduce the "conductivity mismatch" problem prevalent in spin devices with both semiconducting and graphene channels [9]. However, the spin relaxation length in metals is generally short (<1μm) and gets even shorter if there are excessive scattering at the surfaces or grain boundaries at nano-scale dimensions [2].…”

“…Spin Relaxation versus Interconnect Width[2]. Size effects cause the spin relaxation length to decrease with decreasing channel width.…”

BEOL Scaling Limits and Next Generation Technology Prospects

“…Various materials may be utilized to implement the channel in ASL such as metals (Cu and Al), semiconductors (Si and GaAs), and graphene [24]. However, the channel is typically implemented in metals, since metals allow for an easier spin injection through the transmitting nanomagnet.…”