2011
DOI: 10.1063/1.3582613
|View full text |Cite|
|
Sign up to set email alerts
|

Impact of contact resistance on the transconductance and linearity of graphene transistors

Abstract: Interest in graphene device physics and technology has been growing rapidly, especially for very high frequency transistor applications. However, the predicted intrinsic performance has not been fully realized due to impurity and parasitic issues introduced in device fabrication. Through a self-consistent model, we show that the normalized contact resistance has an exponentially detrimental impact on the peak transconductance, which is a defining transistor parameter. In addition, we reveal that very high curr… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

2
44
0

Year Published

2012
2012
2021
2021

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 68 publications
(48 citation statements)
references
References 27 publications
2
44
0
Order By: Relevance
“…Particularly for high frequency electronics, 5,9 which require smaller channel length for higher operation frequency, the contact resistance is the main limiting factor affecting the device operation. 5,6 Graphene, which is a zerobandgap semiconducting material, shares common fabrication processes with conventional semiconducting materials; therefore, rapid thermal annealing could also be applied to improve the quality of metal contacts. In this work, we implement rapid thermal annealing of graphene based field effect transistors to reduce the contact resistance.…”
mentioning
confidence: 99%
See 1 more Smart Citation
“…Particularly for high frequency electronics, 5,9 which require smaller channel length for higher operation frequency, the contact resistance is the main limiting factor affecting the device operation. 5,6 Graphene, which is a zerobandgap semiconducting material, shares common fabrication processes with conventional semiconducting materials; therefore, rapid thermal annealing could also be applied to improve the quality of metal contacts. In this work, we implement rapid thermal annealing of graphene based field effect transistors to reduce the contact resistance.…”
mentioning
confidence: 99%
“…4 The quality of metal contacts is an important issue for graphene based electronic devices. [5][6][7][8] The resistance of the graphene-metal junction, known as contact resistance, limits the performance of devices having small channel length. Particularly for high frequency electronics, 5,9 which require smaller channel length for higher operation frequency, the contact resistance is the main limiting factor affecting the device operation.…”
mentioning
confidence: 99%
“…This resistance is a limiting factor for the performance of electronic devices, and an increasing amount of research has concentrated on this issue. [2][3][4][5][6][7][8] The relative contribution of contact resistance to the total device resistance becomes larger in devices with shorter inter-electrode spacings, i.e., in shorter channel devices. Therefore, contact resistance becomes a predominant factor to consider when attempting to achieve miniaturization and integration of graphene devices.…”
Section: Introductionmentioning
confidence: 99%
“…There are several challenges deterring the stabilization of graphene device properties, such as hysteresis [15,16], high electrical contact resistance [17][18][19], and poor substrate adhesion. These properties have been studied extensively, but only limited progress has been made so far.…”
Section: Introductionmentioning
confidence: 99%