High Voltage Electron Beam Writing for Submicron Design Rule VLSI Fabrications

Yoshimi, M.; Takahashi, Masanori; Kawabuchi, K.; Kato, Y.; Takigawa, Tadahiro

doi:10.7567/ssdm.1982.a-5-8

Extended Abstracts of the 1982 International Conference on Solid State Devices 1982

DOI: 10.7567/ssdm.1982.a-5-8

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High Voltage Electron Beam Writing for Submicron Design Rule VLSI Fabrications

M. Yoshimi¹,

Masanori Takahashi²,

K. Kawabuchi³

et al.

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High Voltage Electron Beam Writing for Submicron Design Rule VLSI Fabrications

Cited by 1 publication

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