A high-accuracy proximity effect correction method for high-precision masks has been developed to satisfy current and future requirements. In this paper, we explain the primary features of this method and the theories on which it is based. The developed formula for obtaining the optimum correction dose is expressed in the form of either iterations or an infinite series of functions. The advantage of this formula is that it quickly converges to the sought value, bringing about high-accuracy proximity effect correction with a high calculation speed. A coarse graining method (covering pattern density and representative figure methods) for reducing calculation time is explained. This method has been adopted for an EX-11 series and has been used for mask writing from the 180 nm design rule onward.
A long-chain betulaprenol-type polyprenol mixture was isolated from the leaves of Ginkgo biloba mainly as acetate. The structure was determined by mass spectroscopy, 1H-n.m.r. spectroscopy and 13C-n.m.r. spectroscopy. The mixture contained polyprenols-14-22, predominantly polyprenols-17, -18 and -19, and consisted of the dimethylallyl terminal unit (omega-terminal), two trans-isoprene residues, a sequence of 11-19 cis-isoprene residues and a terminal hydroxylated isoprene unit (alpha-terminal) aligned in that order. The concentration of these polyprenols in leaves increased from 0.04 to 2.0% of dry wt. with maturing of the leaves, though the content of total lipids was constant. The distribution of chain length in these polyprenols showed little variation throughout the whole life of the leaves.
A new concept for proximity effect correction (the representative figure method) is proposed in order to greatly reduce the correction time. The method assigns only one representative rectangle within a small area whose size is sufficiently smaller than the backscattering range of electrons. Proximity effect correction is carried out by using representative figures instead of the original patterns. This method eliminates the pattern density dependence of the correction time because the pattern density of the representative figures does not exceed the number of small areas. The relative error caused by the representative figure method is at most ±1% for a Ghost-scheme exposure and ±3-4% for the dose correction method.
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