2014
DOI: 10.1021/nl503596j
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High-Speed Planar GaAs Nanowire Arrays with fmax > 75 GHz by Wafer-Scale Bottom-up Growth

Abstract: Wafer-scale defect-free planar III-V nanowire (NW) arrays with ∼100% yield and precisely defined positions are realized via a patterned vapor-liquid-solid (VLS) growth method. Long and uniform planar GaAs NWs were assembled in perfectly parallel arrays to form double-channel T-gated NW array-based high electron mobility transistors (HEMTs) with DC and RF performance surpassing those for all field-effect transistors (FETs) with VLS NWs, carbon nanotubes (CNTs), or graphene channels in-plane with the substrate. … Show more

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Cited by 57 publications
(45 citation statements)
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“…A method have developed for lateral VLS-type of nanowire growth, so called selective lateral epitaxy [64][65][66] . Au seed particles are deposited on a (001) or (110) substrate, typically GaAs.…”
Section: Vls Epitaxial Nanowiresmentioning
confidence: 99%
“…A method have developed for lateral VLS-type of nanowire growth, so called selective lateral epitaxy [64][65][66] . Au seed particles are deposited on a (001) or (110) substrate, typically GaAs.…”
Section: Vls Epitaxial Nanowiresmentioning
confidence: 99%
“…III-V nanostructures have gained increasing attention over the last years due to their prospects in a wide range of applications such as high-speed electronics, 1 optoelectronics, [2][3][4] thermoelectrics 5 and photovoltaics. 6,7 Their small dimensions and tailored shapes can be used to modify the inherent semiconductor properties, thus extending their range of application.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, the chapter consists of three following sections: electrical, mechanical, and electromechanical properties of NWs and represents methods of their investigation by modern SPM approaches. Latter means that magnetic [32][33][34][35], optical [29,[36][37][38][39], acoustic [10,[40][41][42][43][44][45], catalytic [46], and other properties [47][48][49] will not be reflected in recent chapter due to format limitations but are proposed to be accessed from the denoted comprehensive works.…”
Section: Introductionmentioning
confidence: 99%