2022
DOI: 10.1016/j.coche.2021.100782
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High power impulse magnetron sputtering (HiPIMS) for the fabrication of antimicrobial and transparent TiO2 thin films

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Cited by 10 publications
(4 citation statements)
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“…Atomic layer deposition (ALD) and magnetron sputtering (MS) methods are often used to prepare photocatalyst composite films. They can realize the doping [ 40 ] and deposition [ 41 , 42 ] of metal on photocatalysts or the loading of photocatalysts on other substrates [ 43 , 44 ], which can improve the optical properties of materials. The MS method is based on the principle of physical deposition, and the surface of the prepared film is flatter [ 45 ].…”
Section: Tio 2 and Its Composites Materialsmentioning
confidence: 99%
“…Atomic layer deposition (ALD) and magnetron sputtering (MS) methods are often used to prepare photocatalyst composite films. They can realize the doping [ 40 ] and deposition [ 41 , 42 ] of metal on photocatalysts or the loading of photocatalysts on other substrates [ 43 , 44 ], which can improve the optical properties of materials. The MS method is based on the principle of physical deposition, and the surface of the prepared film is flatter [ 45 ].…”
Section: Tio 2 and Its Composites Materialsmentioning
confidence: 99%
“…Post-vacuum annealing, ion implantation, plasma treatment, or electron bombardment are often applied to reduce TiO 2 surface via the introduction of oxygen defects, and to improve its surface reactivity [8][9][10]. Plasma sputtering and plasma-enhanced chemical vapor deposition (PECVD) have been applied to fabricate anatase crystalline films, but with no obvious exposed {001} facets [11]. The growth of anatase single crystal sheetconnected architecture film with two exposed {001} facets and a high surface reactivity is an area that has had little success until now, to the best of our knowledge.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, various approaches such as spray deposition, spin-coating, sol–gel, acid etching, anodic oxidation, physical vapor deposition (PVD), and electrodeposition have been employed to modify antibacterial surfaces, and alter their surface properties, and topology 55 . Among these methods, magnetron sputtering has been shown in several studies to be a suitable and feasible way to modify antibacterial coatings 56 58 . This method offers an excellent opportunity to produce homogeneous, smooth, and dense coatings with a rapid deposition rate, thereby increasing the coating-substrate adherence 59 , 60 .…”
Section: Introductionmentioning
confidence: 99%