2021
DOI: 10.1016/j.optmat.2021.111118
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High-performance broadband photodetector with in-situ-grown Bi2Se3 film on micropyramidal Si substrate

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Cited by 11 publications
(9 citation statements)
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“…The rapid rise and fall times can be ascribed to the bulk heterojunction that can facilitate the dissociating of photo-generated carriers and their transportation to the metal electrode. In comparison to the performance of the Bi 2 Se 3 /n-Si photodetector, our photodetector had a longer detection wavelength than that reported by C. Liu et al [ 18 ] and H. Zhang et al [ 16 ], but was shorter than that reported by X. Hong et al [ 17 ]. However, the responsivity of our photodetector was 10 5 times better than theirs at the wavelength of ~1.5 µm, which was due to our Bi 2 Se 3 film that was thicker than theirs.…”
Section: Resultsmentioning
confidence: 47%
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“…The rapid rise and fall times can be ascribed to the bulk heterojunction that can facilitate the dissociating of photo-generated carriers and their transportation to the metal electrode. In comparison to the performance of the Bi 2 Se 3 /n-Si photodetector, our photodetector had a longer detection wavelength than that reported by C. Liu et al [ 18 ] and H. Zhang et al [ 16 ], but was shorter than that reported by X. Hong et al [ 17 ]. However, the responsivity of our photodetector was 10 5 times better than theirs at the wavelength of ~1.5 µm, which was due to our Bi 2 Se 3 film that was thicker than theirs.…”
Section: Resultsmentioning
confidence: 47%
“…However, it has an indirect bandgap of 1.12 eV at room temperature, which means that it cannot detect infrared light with a wavelength >1.1 μm, including the two important communication wavelengths 1.3 μm and 1.55 μm. In order to extend the silicon detection wavelength, Bi 2 Se 3 has been used to deposit onto silicon to form a heterojunction infrared detector [ 16 , 17 , 18 , 19 ]. Hongbin Zhang et al [ 16 ] fabricated Bi 2 Se 3 by the physical vapor deposition (PVD) method inside a horizontal tube furnace, and the Bi 2 Se 3 /n-Si photodetector with a detection range of 350 nm to 1100 nm, a responsivity of 24.28 A/W, a detectivity of 4.39 × 10 12 Jones, a rise time (t r ) of 2.5 μs and a fall time (t f ) of 5.5 μs.…”
Section: Introductionmentioning
confidence: 99%
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“…Fortunately, the recent results demonstrate that the combination of Bi 2 Se 3 with traditional Si semiconductor arouses great concern because of its mature process, low price, and abundant properties, all of which play an important role in large-scale integrated devices. Moreover, the helical characteristics of the Bi 2 Se 3 topological surface can effectively suppress electron backscattering and enhance carrier mobility, and an obvious exciton gain behavior can be obtained when combining with the Si material . Besides, Bi 2 Se 3 belongs to a triangular crystal system with a layered structure, in which the single molecular layer consists of five atomic layers of Se(1)–Bi–Se(2)–Bi–Se(1) bonded covalently with van der Waals forces between two layers with a layer spacing of about 1 nm, so that high-quality thin films can be easily deposited on the Si substrates by pulsed laser deposition (PLD), metal-organic chemical vapor deposition (MOCVD), and molecular beam epitaxy (MBE). Based on these advantages, some researchers have begun to prepare Bi 2 Se 3 /Si heterostructure, intending to fully utilize their respective excellent properties to achieve a synergistic effect.…”
Section: Introductionmentioning
confidence: 99%