High-brightness ion source for ion projection lithography

Guharay, S. K.; Wang, W.; Dudnikov, Vadim; Reiser, M.; Orloff, J.; Melngailis, J.

doi:10.1116/1.588692

Cited by 15 publications

(5 citation statements)

References 5 publications

(5 reference statements)

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“…The two types of plasma ion sources known as the Penning type [66][67][68][69][70][71][72][73][74][75] and the multicusp type [76][77][78][79][80][81][82][83][84][85][86][87] have been widely studied for focused beam applications. We will discuss these plasma ion sources and compare them with the LMIS.…”

Section: B Plasma Gas Ion Sourcesmentioning

confidence: 99%

Quest for high brightness, monochromatic noble gas ion sources

Tondare

2005

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

110

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Focused ion beam (FIB) machines are key tools for state-of-the art sample preparation in electron microscopy, for characterization and repair in material sciences, for the semiconductor industry and for nanotechnology in general. Liquid-metal ion sources (LMIS) are widely used in FIB machines because they meet the minimum ion source requirements such as source brightness and reliability. However, in FIB machines, noble gas ion sources are favorable for sputtering, beam-induced etching and deposition, because the implanted ions do not change the electrical behavior of the substrate significantly. There are several efforts by various researchers to develop noble gas ion sources that can be used in FIB machines instead of LMIS. The gas ion sources could not meet the minimum ion source requirements. Therefore, LMIS are still a popular choice among FIB machine users. This review article takes a critical look at the reported efforts in the literature to develop noble gas ion sources for FIB machines.

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Section: B Plasma Gas Ion Sourcesmentioning

confidence: 99%

Quest for high brightness, monochromatic noble gas ion sources

Tondare

2005

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

110

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“…Transverse ion temperature on the extraction surface is T i~3 eV. The effective brightness, B = j/T i = 0.1 A/cm 2 eV is relatively high, but it is 10 times smaller, then the pulsed SPS [4]. Increase of gas density improves chargeexchange cooling and thus increases the brightness but electron stripping will also increase.…”

Section: Sps Configurationsmentioning

confidence: 99%

“…Some of these applications require very high brightness beams [1,2,3]. Hbeams with very high brightness have been produced from pulsed Surface Plasma Sources (SPS) with charge exchange cooling of the ions [4]. For DC production of negative ion beam with a high emission current density, an SPS with hollow cathode discharge and spherical geometrical focusing of negative ions was developed [5].…”

Section: Introductionmentioning

confidence: 99%

Optimization of surface plasma sources for efficient production of negative ions with high emission current density

Farrell¹,

Dudnikov²,

Dudnikova

2001

AIP Conference Proceedings

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The main mechanism of negative ion formation in a Surface Plasma Source (SPS) is secondary emission of sputtered and scattered particles accompanied by capture of electrons from the electrodes. In the first, pulsed, versions of the SPS, adding a small amount of cesium increased the emission current density for light ions up to 3.7 A/cm 2 with a flat emitter and up to 8 A/cm 2 after optimization of geometrical focusing. Since this power density was too high for DC operation, LBL developed a large volume SPS with a hot cathode discharge, a large emitter-emission aperture gap and low emission current density. The LBL type of SPS was used for some accelerators and for heavy negative ion production with emission current density of 10 mA/cm 2. Researchers at Budker Institute of Nuclear Physics (BINP) developed a small SPS optimized for long time DC operation. In the BINP source, DC Hcurrent up to 2.5 mA and heavy ion current up to 1 mA have been extracted from a 1 mm diameter aperture using an improved SPS that employs a hollow cathode discharge and spherical focusing of negative ions toward the emission aperture. This paper describes further optimization of this type source for production of negative ion beam with a high emission current density.

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“…The transverse ion temperature on the extraction surface is T i~3 eV. An effective brightness, B=j -/T i = 0.1 A/cm eV, was relative high, but 10 times smaller then for a pulsed SPS [3]. For the beam line test the extraction aperture of 1 mm diameter was closed to 0.2 mm stainless steel foil with aperture 0.3 mm.…”

Section: Operation Of This Sps Was Examined In the Beam Line Testmentioning

confidence: 99%

“…To detect the low level of aberration an ion beam with a small emittance and high brightness is needed, as for ion lithography [2]. H -beams with high brightness have been produced from pulsed Surface Plasma Sources (SPS) with a charge-exchange conversion giving cooling to the ions [3]. For DC production of a negative ion beam with a high emission current density, a SPS with a hollow cathode discharge and spherical geometrical focusing of the negative ions was developed [4].…”

Section: Introductionmentioning

confidence: 99%

High current density negative ion source for beam line transport studies

Dudnikov

Schmidt²,

Hren³

et al.

PACS2001. Proceedings of the 2001 Particle Accelerator Conference (Cat. No.01CH37268)

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The Fermilab Electron Cooling Program requires a 20-m solenoidal region to interact 8-GeV antiprotons with an escorting beam of 4.3-MeV electrons to improve the phase-space quality of the antiproton beam. The solenoidal section with additional transport lines to take and return a 0.5-A electron beam from an electrostatic accelerator, for energy recovery, must be precisely aligned and adjusted. For the initial setup and study, and later testing of this line, a 12.4-keV H -beam can be used to simulate the 4.3 MeV electron beam. For this purpose a high-brightness H -ion source has been developed and tested. The source, a semiplanatron type, with a hollow cathode discharge and spherical cathode focusing of the emitted ions to the emission aperture has given an emission current density up to 0.7 A/cm 2 . Continuous operation of 4 weeks has been demonstrated. Such an optimized source could have many applications for tandem accelerators, ion beam lithography and ion implantation.

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High-brightness ion source for ion projection lithography

Cited by 15 publications

References 5 publications

Quest for high brightness, monochromatic noble gas ion sources

Quest for high brightness, monochromatic noble gas ion sources

Optimization of surface plasma sources for efficient production of negative ions with high emission current density

High current density negative ion source for beam line transport studies

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