“…However, the results shown in the previous section were obtained during sputtering on non-epitaxial substrates such as amorphous SiO 2 . After Goto et al [10,12], PO without the influence of epitaxial growth is sometimes referred to ''self-texture,'' which means a textured structure caused by the film itself without the influence of the substrate. Minimization of surface energy is the most frequently referred to term to explain the origin of selftexture.…”