2005
DOI: 10.1016/j.jeurceramsoc.2004.08.028
|View full text |Cite
|
Sign up to set email alerts
|

Structural and electrical properties of aluminum-doped zinc oxide films prepared by sol–gel process

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

1
18
0

Year Published

2007
2007
2018
2018

Publication Types

Select...
7
1

Relationship

1
7

Authors

Journals

citations
Cited by 61 publications
(19 citation statements)
references
References 23 publications
1
18
0
Order By: Relevance
“…The same trend is observed for the mobility values which are smaller than that of single ZnO crystals (180 cm 2 /V•s) [28]. Essentially, the same behavior was observed for zinc oxide films doped with aluminum [26] [27] or boron [29]. Scattering at grain boundaries is sometimes postulated in polycrystalline films with small crystallite size.…”
Section: Electrical Propertiessupporting
confidence: 64%
See 1 more Smart Citation
“…The same trend is observed for the mobility values which are smaller than that of single ZnO crystals (180 cm 2 /V•s) [28]. Essentially, the same behavior was observed for zinc oxide films doped with aluminum [26] [27] or boron [29]. Scattering at grain boundaries is sometimes postulated in polycrystalline films with small crystallite size.…”
Section: Electrical Propertiessupporting
confidence: 64%
“…However, one should note that the TG/DTA results should not be directly extrapolated to the case of a film, because they were recorded on gel powders and at a slow heating rate, whereas the films prepared in this study were rapidly calcined in a preheated furnace [26]. The weight loss of the dried gel as a function of temperature indicates there are distinct temperature regions for decomposition.…”
Section: Thermo-gravimetric and Differential Thermal Analysismentioning
confidence: 95%
“…The electrical properties of the oxides depend critically on the oxidation state of the metal component (stoichiometry of the oxide) and on the nature and quantity of impurities incorporated into the films, either intentionally or inadvertently 43 . Oxygen vacancies occupied with two electrons as well as zinc interstitials are the two types of defects responsible for the n‐type conductivity in pure ZnO 44,45 …”
Section: Resultsmentioning
confidence: 99%
“…Various sources of electron scattering may influence the electrical properties of semiconducting thin films. Grain boundaries, ionized point defects, and neutral impurities are the major scattering centers 44 . When the film was built up with relatively thick layers, the grain size was small (see Table IV), and the grain boundary scattering is a crucial factor that results in mediocre mobility values.…”
Section: Resultsmentioning
confidence: 99%
“…ZnO films can be prepared by many methods, such as thermal oxidation of Zn metallic films [109], sol gel process [110], sputtering [111], chemical vapor deposition [112], pulse laser deposition [113], evaporating method [114], and electrochemical process [115,116].…”
Section: Nanocrystalline Znomentioning
confidence: 99%