GDS-based Mask Data Preparation Flow: Data Volume Containment by Hierarchical Data Processing

Schulze, Steffen; LaCour, Pat; Buck, Peter

doi:10.1117/12.468273

Cited by 8 publications

(10 citation statements)

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“…The need for mask data manipulation for process optimization, mask proximity correction and final mask writer formatting in the mask house has been outlined previously [4]. It is widely accepted that hierarchical processing enables faster processing time and results in smaller output files [4,5]. One barrier for the implementation of the hierarchical data processing flow is the fact that the MEBES files generated of a design data set were frequently smaller than the original GDSII file thus generating a benefit for the file transfer.…”

Section: Methodsmentioning

confidence: 98%

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OASIS-based data preparation flows: progress report on containing data size explosion

2004

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The ever-increasing complexity of integrated circuits and their enabling process technology has accelerated the increase in data volume of post-RET data which is input to the photomask manufacturing industry. OASIS -the new stream format that has been developed by a working group under the sponsorship of the SEMI Data Path Task Force enables the representation of IC layout data in a much more compact form than GDSII and facilitates the incorporation of hierarchical data into the mask-making infrastructure. OASIS achieves on average a >10x reduction in file size compared to GDSII files and structures the data in a way, which allows a straightforward translation from a hierarchical format to the required flat mask perspective. Owing to the efficiency in representing the data, OASIS files are smaller than commonly used flat exchange formats -like MEBES, thus enabling an efficient hierarchical data flow both from the processing as well as the file handling prospective. The implementation of OASIS into post-tapeout data flows will be discussed and experimental results on OASIS-based data preparation flows will be shown.

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Section: Methodsmentioning

confidence: 98%

“…between a design house and a mask manufacturer. The need for mask data manipulation for process optimization, mask proximity correction and final mask writer formatting in the mask house has been outlined previously [4]. It is widely accepted that hierarchical processing enables faster processing time and results in smaller output files [4,5].…”

Section: Methodsmentioning

confidence: 99%

OASIS-based data preparation flows: progress report on containing data size explosion

2004

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“…It has been shown that the fracturing itself can be optimized by conducting it in a hierarchical flow with an algorithm that focuses on the suppression of small figures while seeking the optimum trapezoiding for a minimum shot count [3]. The flow based on hierarchical data (GDSII) provides a small output file size and has the fastest turn around time in the data processing [4]. The influence of the complexity of OPC on the performance parameters of the VSB-fractured output has been widely discussed in the data preparation community [3,5,6].…”

Section: Introductionmentioning

confidence: 99%

Optimization of data handling prior to fracturing for reduction of mask writing time

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Schulze

2003

SPIE Proceedings

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As the industry is targeting the sub-100nm nodes, the pressure on the data path and tapeout flow is growing. Design complexity and increased deployment of resolution enhancement techniques (RET) result in rapidly growing file sizes, which turns what used to be the relatively simple task of mask data preparation into a real bottleneck. Previous work indicated that the properties of the incoming layout ñ hierarchy, grid, aggressiveness of the RET solution have a major impact on the performance of fracturing and mask writing The tuning of OPC can reduce itís impact on subsequent fracturing. This study investigates the impact of OPC setup-various fragmentation parameters like fragment length, density, interaction radius and, various line-end correction schemes on the performance parameters for the mask data preparation and mask writing. Parameters like run-time, file size, shot count and small figures will be reported in dependence on the input layout preparation history. Approaches to optimize the integrated RET and MDP flow while maintaining manufacturability and the required CD control are introduced and evaluated.

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“…The transition of the data in form of GDSII into the mask writer format was usually a simple two step process -application of a general process bias (combination of mask and wafer lithography) and fracturing/formatting. The implementation of this simple flow was frequently shifted from the mask supplier side to the data supplier side since it was not very demanding [1]. A common flow as it is encountered today looks quite different.…”

mentioning

confidence: 95%

“…Design trends indicate that for performance enhancements in data storage and data processing larger and larger arrays are going to be incorporated into designs [2]. The benefits of hierarchy for data processing have been largely discussed in literature [1,[3][4][5][6]. It provides for the smallest file size and the fastest processing time.…”

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confidence: 97%

The prospects for hierarchical data processing with growing complexity of the post-tapeout flow

Schulze

Sahouria

2005

Design and Process Integration for Microelectronic Manufacturing III

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The drive of the semiconductor industry towards smaller and smaller features sizes requires more sophisticated correction methods to guarantee the final tolerances for the etched features in both wafer manufacturing and mask making. The wavelength gap in lithography and process effects as well as dependencies on the design content have led to the tremendous variety of resolution enhancement techniques and process correction approaches that are currently applied to a design on its path to manufacturing. As the 65nm nodes become production ready and the 45nm node shifts into the focus of the development effects like flare in wafer exposure, fogging effects in ebeam mask exposure and others that previously could be ignored are becoming significant so that their correction prior to manufacturing is required. That means additional correction steps are necessary to complete the data preparation. These put a larger burden on the data processing path and raise concerns over data volume and processing time limitations. Hierarchical processing methods have proven very effective in the past to keep data volumes and processing time in control. The paper explores the design trends and the potential of hierarchical processing under the new circumstances. Extended data flows with a variety of correction steps are investigated. Experimental results that demonstrate the benefit of hierarchical methods in conjunction with parallel processing methods like multithreading and distributed processing are provided. The benefit of introducing more effective data formats like OASIS in these flows will be illustrated.Historically the completion of a design was marked by the full chip verification and the delivery of a DRC an LVS clean layout. The transition of the data in form of GDSII into the mask writer format was usually a simple two step process -application of a general process bias (combination of mask and wafer lithography) and fracturing/formatting. The implementation of this simple flow was frequently shifted from the mask supplier side to the data supplier side since it was not very demanding [1]. A common flow as it is encountered today looks quite different. Figure 1 gives an example of a typical sequence as encountered in 90nm or 65nm data flows. The complexity is largely driven by the variety of processing effects that require data correction -CMP and etch processes drive the need for leveling pattern density via fill or slotting. These structures are printable elements and are inserted into the layout as part of the preprocessing prior to corrections for the imaging. A next step is rules based data corrections. This includes the insertion of non-printable assist-features for process window improvement for isolated features as well as other rules based corrections like a table driven OPC or target correction. Alternately, a phase shifting mask set can be derived to print the design pattern. After the contents of the layout are fully defined the model based OPC is applied. This functional block is followed by verification ste...

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GDS-based Mask Data Preparation Flow: Data Volume Containment by Hierarchical Data Processing

Cited by 8 publications

References 0 publications

OASIS-based data preparation flows: progress report on containing data size explosion

OASIS-based data preparation flows: progress report on containing data size explosion

Optimization of data handling prior to fracturing for reduction of mask writing time

The prospects for hierarchical data processing with growing complexity of the post-tapeout flow

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