Abstract:As the industry is targeting the sub-100nm nodes, the pressure on the data path and tapeout flow is growing. Design complexity and increased deployment of resolution enhancement techniques (RET) result in rapidly growing file sizes, which turns what used to be the relatively simple task of mask data preparation into a real bottleneck. Previous work indicated that the properties of the incoming layout ñ hierarchy, grid, aggressiveness of the RET solution have a major impact on the performance of fracturing and … Show more
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