2011
DOI: 10.1134/s1063782611080112
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Ga2O3 films formed by electrochemical oxidation

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Cited by 16 publications
(9 citation statements)
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“…Ga 2 O 3 films with thicknesses between 200-300 nm were grown by anodic oxidation of n GaAs wafers with the donor concentration N d = (1-2) × 10 16 cm -3 .The film fabrication technology and measurement tech nique were described in [1].…”
Section: Methodsmentioning
confidence: 99%
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“…Ga 2 O 3 films with thicknesses between 200-300 nm were grown by anodic oxidation of n GaAs wafers with the donor concentration N d = (1-2) × 10 16 cm -3 .The film fabrication technology and measurement tech nique were described in [1].…”
Section: Methodsmentioning
confidence: 99%
“…The effect of oxygen plasma on the capacitance of samples annealed at 900°C is opposite to the changes in C for the unannealed V/Ni-GaAs-Ga 2 O 3 -V/Ni structures. It was shown in study [1] that the capaci tance of the unannealed samples increases with dura tion of the oxygen plasma treatment. Irrespective of the oxygen plasma treatment conditions before anneal ing, the capacitance of the V/Ni-GaAs-Ga 2 O 3 -V/Ni structures after annealing at 900°C changed insignifi cantly with increasing voltage upon both positive and negative potentials on the control electrode (curves 3-6 in Fig.…”
Section: Electrical Characteristicsmentioning
confidence: 96%
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“…The roughness of continuous β Ga 2 O 3 layers grown on the GaSe (0001) surface using such a tech nique did not exceed ~0.2 nm. We note that the surface roughness of β Ga 2 O 3 layers grown on n GaAs by electrochemical oxidation [22] or thermal oxidation of the GaSe(0001) surface in air at T a > 300°C [7] was several nm. The β Ga 2 O 3 compound is a defect n type semiconductor that has a monoclinic structure with the lattice parameters a = 12.23 Å, b = 3.04 Å, c = 5.8 Å, β = 103.7°.…”
Section: Surface Morphology Of Hybrid Nanostructuresmentioning
confidence: 99%
“…Due to its electrical and optical properties (transparent for visible and reflective for infrared light) and good chemical and mechanical stability, it is commonly used in oxidation catalysis, gas sensing, transparent conducting oxides and opto-electronic devices [1][2][3]. The properties of SnO 2 nanostructures can be enhanced in several ways such as impurity doping, polymeric additives and annealing [4,5]. However, the stoichiometric SnO 2 leads to low performance because of the low intrinsic carrier density and mobility, mainly as a result of the double ionized vacancies serving as donors [6][7][8].…”
Section: Introductionmentioning
confidence: 99%