2012
DOI: 10.1134/s1063782612030050
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Surface morphology and electrical properties of Au/Ni/〈C〉/n-Ga2O3/p-GaSe〈KNO3〉 hybrid structures fabricated on the basis of a layered semiconductor with nanoscale ferroelectric inclusions

Abstract: Features of the formation of Au/Ni/〈C〉/n Ga 2 O 3 hybrid nanostructures on a Van der Waals sur face (0001) of "layered semiconductor-ferroelectric" composite nanostructures (p GaSe〈KNO 3 〉) are stud ied using atomic force microscopy. The room temperature current-voltage characteristics and the depen dence of the impedance spectrum of hybrid structures on a bias voltage are studied. The current-voltage characteristic includes a resonance peak and a portion with negative differential resistance. The current atta… Show more

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Cited by 8 publications
(13 citation statements)
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“…Electrochemical intercalation produces no changes in the crystal structure of layered semicon ductors, and the intercalate localizes at point and sur face defects in interlayer spaces, producing nanostruc tures of different morphologies [17,18]. As shown by Kakhramanov [19] and Aleskerov and Kakhramanov [20], the intercalation of Ві 2 Те 3 with metal (Cu, Ag, and Ni) atoms leads to accumulation, redistribution, and formation of intercalate nanoinclusions in inter layer spaces along the plane of the (0001) layers; that is, an additional layer of metal nanoinclusions forms in the crystal lattice.…”
Section: Resultsmentioning
confidence: 99%
“…Electrochemical intercalation produces no changes in the crystal structure of layered semicon ductors, and the intercalate localizes at point and sur face defects in interlayer spaces, producing nanostruc tures of different morphologies [17,18]. As shown by Kakhramanov [19] and Aleskerov and Kakhramanov [20], the intercalation of Ві 2 Те 3 with metal (Cu, Ag, and Ni) atoms leads to accumulation, redistribution, and formation of intercalate nanoinclusions in inter layer spaces along the plane of the (0001) layers; that is, an additional layer of metal nanoinclusions forms in the crystal lattice.…”
Section: Resultsmentioning
confidence: 99%
“…Thin Ga 2 O 3 oxide layers on the GaSe(0001) sur face can be formed using both thermal annealing of the crystals in an oxygen containing atmosphere and the oxidation of this surface under UV light irradiation [15]. When the irradiation is performed using the technology described in [15], the radiation with a pho ton energy greater than the GaSe band gap is absorbed in the upper layers of the crystal.…”
Section: Resultsmentioning
confidence: 99%
“…When the irradiation is performed using the technology described in [15], the radiation with a pho ton energy greater than the GaSe band gap is absorbed in the upper layers of the crystal. Anisotropic layered GaSe crystals have a low thermal conductivity along the C axis.…”
Section: Resultsmentioning
confidence: 99%
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