Formation of epitaxial and textured platinum films on ceramics-(100) MgO single crystals by pulsed laser deposition

Abstract

We have investigated the formation of textured and epitaxial metallic films on (100) MgO single crystals substrates (lattice constant a=4.21 Å) as a function of deposition temperature during pulsed laser ablation. Platinum (a=3.92 Å) films on MgO with lattice misfit of 7.4% were found to grow epitaxially in the temperature range 500–700 °C. Three-dimensional x-ray diffraction results (theta, phi, and chi scans) show 〈100〉 epitaxy with the alignment of all three cube axes. Rutherford backscattering and channeling measurements on a film deposited at 700 °C showed a minimum yield of 2.2%, which is very close to the defect-free single crystal value. In the temperature range 200–500 °C both 〈100〉 and 〈111〉 textures were observed. The 〈111〉 oriented (normal to the surface) films were random in the plane of the substrate, whereas 〈100〉 crystallites were epitaxial. Below 200 °C, only 〈111〉 crystallites were observed. The 〈111〉 texture of platinum films is also observed when grown on amorphous substrates such as SiO2. The experimental results are normalized with theoretical simulations addressing the minimization of film energy.

Off‐Stoichiometry of Magnetron Sputtered Ba1−xSrxTiO3 Thin Films

“…Furthermore XRD rocking‐curve measurements ( ω ‐scans) were performed for the Pt(200), Pt(220), and the Pt(111) reflections which showed a full width half maximum of 0.14°, 0.27°, and 0.15°, respectively, pointing toward a highly orientated films. Similar results are reported for epitaxial growth of Pt thin films on MgO and sapphire substrates by other groups …”

Strontium Barium Niobate Thin Films for Dielectric and Electro-Optic Applications

“…However the reported temperature range in which the film orientation switches varies with the deposition technique: the lower the average energy of the depositing species, the higher the substrate temperature necessary to yield a dominant (001) Pt texture (Lairson et al, 1992;Narayan et al, 1994;McIntyre et al, 1995). This suggests that the incident kinetic and subsequent thermal energies of the depositing species are complementary regarding an energy threshold for the (001) Pt growth.…”

Tuning the Surface Electrochemistry by Strained Epitaxial Pt Thin Film Model Electrodes Prepared by Pulsed Laser Deposition

“…Several deposition techniques can in principle be used to produce thin Pt films. They vary from electrodeposition, sputtering, e‐beam evaporation, and atomic layer deposition to PLD . PLD is a technique used for the thin films preparation for a variety of materials .…”

“…Several studies have been dedicated to the PLD growth of (111)‐ and (001)‐oriented Pt films. For instance, (111)‐oriented Pt films were successfully grown on (100) yttrium‐stabilized zirconia (YSZ) at substrate temperatures from 200–800 °C .…”