During the last few years the developments in the field of III–nitrides have been spectacular. High quality epitaxial layers can now be grown by MOVPE. Recently good quality epilayers have also been grown by MBE. Considerable work has been done on dislocations, strain, and critical thickness of GaN grown on different substrates. Splitting of valence band by crystal field and by spin-orbit interaction has been calculated and measured. The measured values agree with the calculated values. Effects of strain on the splitting of the valence band and on the optical properties have been studied in detail. Values of band offsets at the heterointerface between several pairs of different nitrides have been determined. Extensive work has been done on the optical and electrical properties. Near band-edge spectra have been measured over a wide range of temperatures. Free and bound exciton peaks have been resolved. Valence band structure has been determined using the PL spectra and compared with the theoretically calculated spectra. Strain and its effect on the optical properties of the III–nitride layers have been studied both theoretically and experimentally. Both n and p conductivity have been achieved. InGaN quantum wells with GaN and AlGaN barriers and cladding layers have been investigated. PL of the quantum wells is affected by confinement effects, band filling, quantum confined Stark effect, and strain. This work has led to the fabrication of advanced optoelectronic and electronic devices. The light-emitting decodes emitting in the blue and green regions of the spectrum have been commercialized. The work leading to these developments is reviewed in this article. The device processing methods and actual devices are not discussed.

We present a unified model for thin film epitaxy where single crystal films with small and large lattice misfits are grown by domain matching epitaxy (DME). The DME involves matching of lattice planes between the film and the substrate having similar crystal symmetry. In this framework, the conventional lattice matching epitaxy becomes a special case where a matching of lattice constants or the same planes is involved with a small misfit of less than 7%–8%. In large lattice mismatch systems, we show that epitaxial growth of thin films is possible by matching of domains where integral multiples of major lattice planes match across the interface. We illustrate this concept with atomic-level details in the TiN/Si(100) with 3/4 matching, the AlN/Si(100)with 4/5 matching, and the ZnO/α−Al2O3(0001) with 6/7 matching of major planes across the film/substrate interface. By varying the domain size, which is equal to intregral multiple of lattice planes, in a periodic fashion, it is possible to accommodate additional misfit beyond perfect domain matching. Thus, we can potentially design epitaxial growth of films with any lattice misfit on a given substrate with atomically clean surfaces. In situ x-ray diffraction studies on initial stages of growth of ZnO films on sapphire correctly identify a compressive stress and a rapid relaxation within 1 to 2 monolayers, consistent with the DME framework and the fact that the critical thickness is less than 1 monolayer. DME examples ranging from the Ge–Si/Si(100) system with 49/50 matching (2% strain) to metal/Si systems with 1/2 matching (50% strain) are tabulated, strategies for growing strain-free films by engineering the misfit to be confined near the interface are presented, and the potential for epitaxial growth of films with any lattice misfit on a given substrate with atomically clean surfaces is discussed.

We have studied in detail the physical phenomena involved in the interaction of high-powered nanosecond excimer-laser pulses with bulk targets resulting in evaporation, plasma formation, and subsequent deposition of thin films. A theoretical model for simulating these laser-plasma-solid interactions has been developed. In this model, the laser-generated plasma is treated as an ideal gas at high pressure and temperature, which is initially confined in small dimensions, and is suddenly allowed to expand in vacuum. The three-dimensional expansion of this plasma gives rise to the characteristic spatial thickness and compositional variations observed in laser-deposited thin films of multicomponent systems. The forward-directed nature of the laser evaporation process has been found to result from anisotropic expansion velocities of the atomic species which are controlled by the dimensions of the expanding plasma. Based on the nature of interaction of the laser beam with the target and the evaporated material, the pulsed-laser evaporation (PLE) process can be classified into three separate regimes: (i) interaction of the laser beam with the bulk target, (ii) plasma formation, heating, and initial three-dimensional isothermal expansion, and (iii) adiabatic expansion and deposition of thin films. The first two processes occur during the time interval of the laser pulse, while the last process initiates after the laser pulse terminates. Under PLE conditions, the evaporation of the target is assumed to be thermal in nature, while the plasma expansion dynamics is nonthermal as a result of interaction of the laser beam with the evaporated material. The equations of compressible gas dynamics are set up to simulate the expansion of the plasma in the last two regimes. The solution of the gas-dynamics equations shows that the expansion velocities of the plasma are related to its initial dimensions and temperature, and the atomic weight of the species. Detailed simulations analyzing the salient features of the laser-deposition process have been carried out. The effects of various beam and substrate parameters including pulse energy density, substrate-target distance, irradiated spot size, and atomic mass of the species have been theoretically analyzed. This model predicts most of the characteristic experimental features of the laser evaporation and deposition of thin films. These characteristic features include (a) the effect of pulse energy density on atomic velocities, (b) the forward-directed nature of the deposit and its dependence on energy density, (c) spatial compositional variations in multicomponent thin films as a function of energy density, (d) dependence of the atomic velocities with atomic weights of various species in multicomponent films, (e) athermal non-Maxwellian-type velocity distribution of the atomic and molecular species, and (f) thickness and compositional variations as a function of substrate-target distance and irradiated spot size.

The optical and structural properties of high-quality single-crystal epitaxial MgZnO films deposited by pulsed-laser deposition were studied. In films with up to ∼36 at. % Mg incorporation, we have observed intense ultraviolet band edge photoluminescence at room temperature and 77 K. The highly efficient photoluminescence is indicative of the excitonic nature of the material. Transmission spectroscopy was used to show that the excitonic structure of the alloys was clearly visible at room temperature. High-resolution transmission electron microscopy, x-ray diffraction, and Rutherford backscattering spectroscopy/ion channeling were used to verify the epitaxial single-crystal quality of the films and characterize the defect content. Post-deposition annealing in oxygen was found to reduce the number of defects and to improve the optical properties of the films. These results indicate that MgZnO alloys have potential applications in a variety of optoelectronic devices.

The optical properties of high quality single crystal epitaxial zinc oxide thin films grown by pulsed laser deposition on c-plane sapphire substrates were studied. It was found that annealing the films in oxygen dramatically improved the optical and electrical properties. The absorption coefficient, band gap, and exciton binding energies were determined by transmission measurements and photoluminescence. In both the annealed and the as-deposited films excitonic absorption features were observed at both room temperature and 77 K. In the annealed films the excitonic absorption peaks were substantially sharper and deep level photoluminescence was suppressed.

Vanadium oxide (VO2) exhibits a very interesting semiconductor to metal transition as the crystal structure changes from tetragonal or rutile to monoclinic upon cooling close to 68°C. The characteristics of this transition are very interesting scientifically and are of immense technological importance due to a variety of sensor- and memory-type applications. We have processed high-quality films of VO2 by pulsed laser deposition, which were grown epitaxially on (0001) sapphire substrate via domain matching epitaxy, involving matching of integral multiples of lattice planes between the film of monoclinic structure and the sapphire substrate. These films exhibit a sharp transition near 68°C, large amplitude, and very small hysteresis, similar to bulk single crystal of VO2. The sharpness and amplitude of the transition and the hysteresis upon heating and cooling are found to be a strong function of crystal structure and microstructure (grain size, characteristics of grain boundaries, and defect content). Here, we propose a model to establish microstructure-property correlations in crystalline and amorphous phases of VO2, which can be used to rationalize our experimental observations as well as those available in the literature. Based upon this model, we predict specific microstructures leading to properties needed for various sensor- and memory-type devices.

Here we report a systematic study of structural, optical, and magnetic measurements on epitaxial Zn0.9Co0.1O films grown on c-plane sapphire single crystal, at various temperatures (500–650°C), using pulsed-laser deposition. The main emphasis in this work has been on the correlation of microstructure with properties, specifically with magnetic properties and the fate of cobalt ions into substitutional sites versus precipitates. The reasons for room-temperature ferromagnetism are explored, and convincingly proved to be one of the inherent properties of the material. Most importantly, the presence of nanoclusters of any magnetic phase was ruled out. This was determined by high-resolution transmission electron microscopy, coupled with electron energy loss spectroscopy and STEM-Z (scanning transmission electron microscopy-atomic number) contrast studies.

In this paper, we report on the metal-semiconductor transition behavior observed in transparent and conducting ZnO:Ga films grown by pulsed-laser deposition. The electrical resistivity measurements were carried out on ZnO films with varying Ga concentration in the temperature range of 14to300K. The electrical properties were correlated with film structure, and detailed structural characterization was performed using x-ray diffraction, transmission electron microscopy, and x-ray photoelectron spectroscopy. The room-temperature resistivity of these films was found to decrease with Ga concentration up to 5% Ga, and then increase. The lowest value of resistivity (1.4×10−4Ωcm) was found at 5% Ga. Temperature dependent resistivity measurements showed a metal-semiconductor transition, which is rationalized by localization of degenerate electrons. A linear variation of conductivity with T below the transition temperature suggests that the degenerate electrons are in a weak-localization regime. It was also found that the transition temperature is dependent on the Ga concentration and is related to the increase in disorder induced by dopant addition. The results of this research help to understand the additional effects of dopant addition on transport characteristics of transparent conducting oxides (TCOs) and are critical to further improvement and optimization of TCO properties.