2019
DOI: 10.1021/acs.jpcc.9b03069
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Ferroelectric ZrO2 Monolayers as Buffer Layers between SrTiO3 and Si

Abstract: A monolayer of ZrO2 has recently been grown on the Si(001) surface and shown to have ferroelectric properties, which signifies the realization of the lowest possible thickness in ferroelectric oxides (M. Dogan et al., Nano Lett., 18 (1) (2018) [1]). In our previous computational study, we reported on the multiple (meta)stable configurations of ZrO2 monolayers on Si, and how switching between a pair of differently polarized configurations may explain the observed ferroelectric behavior of these films (M. Dogan … Show more

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Cited by 3 publications
(1 citation statement)
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“…An appropriate buffer layer is therefore necessary to prevent Si from being oxidized. Until now, numerous atomic structures have been proposed as buffer layers both theoretically and experimentally. Among them, as the first successful report for direct epitaxial growth of single-crystal STO on Si, elemental Sr for the preparation of the buffer layer is important and widely studied …”
Section: Introductionmentioning
confidence: 99%
“…An appropriate buffer layer is therefore necessary to prevent Si from being oxidized. Until now, numerous atomic structures have been proposed as buffer layers both theoretically and experimentally. Among them, as the first successful report for direct epitaxial growth of single-crystal STO on Si, elemental Sr for the preparation of the buffer layer is important and widely studied …”
Section: Introductionmentioning
confidence: 99%